Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL27638113 | 1.00 | — | — | |
| SCHEMBL316571 | 0.96 | — | — | |
| SCHEMBL1371659 | 0.96 | — | — | |
| SCHEMBL1153665 | 0.96 | — | — | |
| Fluoride SCHEMBL11792079 | 0.92 | — | — | |
| Hydrochloric Acid SCHEMBL1369896 | 0.92 | — | — | |
| Hydrochloric Acid SCHEMBL1369701 | 0.92 | — | — | |
| Hydrochloric Acid SCHEMBL1369704 | 0.92 | — | — | |
| Bicarbonate SCHEMBL8040728 | 0.83 | ALDH1A1 (0.42) | — | |
| Water SCHEMBL2817750 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2778782-B1 | Negative working radiation-sensitive elements | KODAK GRAPHIC COMM GMBH (DE) | 2015-12-30 | — | — | EP | disclosed |
| EP-2778782-A1 | Negative working radiation-sensitive elements | Kodak Graphic Communications GmbH (DE) | 2014-09-17 | — | — | EP | disclosed |
| EP-2735903-A1 | Negative working lithographic printing plate precursors comprising a hyperbranched binder material | Eastman Kodak Company (US) | 2014-05-28 | — | — | EP | disclosed |
| US-8652759-B2 | Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer | EASTMAN KODAK COMPANY (US) | 2014-02-18 | — | — | US | disclosed |
| US-8507181-B2 | Method for developing and sealing of lithographic printing plates | KODAK (NEAR EAST) INC. | 2013-08-13 | — | — | US | disclosed |
| US-8361701-B2 | Method for making lithographic plates | EASTMAN KODAK COMPANY (US) | 2013-01-29 | — | — | US | disclosed |
| EP-2293144-B1 | Method of drying lithographic printing plates after single-step-processing | EASTMAN KODAK CO (US) | 2012-11-07 | — | — | EP | disclosed |
| US-20120152139-A1 | METHOD AND APPARATUS FOR DRYING AFTER SINGLE-STEP-PROCESSING OF LITHOGRAPHIC PRINTING PLATES | QUALEX INC. | 2012-06-21 | — | — | US | disclosed |
| EP-2284005-B1 | Lithographic printing plate precursors with beta-hydroxy alkylamide crosslinkers | EASTMAN KODAK CO (US) | 2012-05-02 | — | — | EP | disclosed |
| US-8105755-B2 | Method for processing of photopolymer printing plates with overcoat | EASTMAN KODAK COMPANY (US) | 2012-01-31 | — | — | US | disclosed |
| WO-2006063626-A2 | STABLE HIGH PH DEVELOPER | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2006-06-22 | — | — | WO | disclosed |
| EP-1557161-A1 | Method for cleansing sensitive skin using an alkanolamine | Johnson & Johnson Consumer Companies, Inc. (US) | 2005-07-27 | — | — | EP | disclosed |
| US-20040213754-A1 | Method for cleansing sensitive skin using an alkanolamine | JOHNSON & JOHNSON CONSUMER COMPANIES, INC. | 2004-10-28 | — | — | US | disclosed |
| EP-1295593-A1 | Skin cleanser containing anti-aging active | Johnson & Johnson Consumer Companies, Inc. (US) | 2003-03-26 | — | — | EP | disclosed |
| US-20020071818-A1 | Skin cleanser containing anti-aging active | JOHNSON & JOHNSON CONSUMER COMPANIES, INC. | 2002-06-13 | — | — | US | disclosed |
| EP-0804753-B1 | METHOD OF DEVELOPING POSITIVE PHOTORESIST AND DEVELOPING COMPOSITIONS THEREFOR | CLARIANT FINANCE BVI LTD (VG) | 2001-05-02 | — | — | EP | disclosed |
| US-5821036-A | DEVELOPER INCLUDES AN AMMONIUM HYDROXIDE AQUEOUS BASE AND A SURFACTANT OF THE FLUORINATED ALKYL ALKOXYLATE CLASS | CLARIANT FINANCE (BVI) LIMITED (VG) | 1998-10-13 | — | — | US | disclosed |
| EP-0804753-A1 | METHOD OF DEVELOPING POSITIVE PHOTORESIST AND COMPOSITIONS THEREFOR | HOECHST CELANESE CORPORATION (US) | 1997-11-05 | — | — | EP | disclosed |
| WO-1997034200-A1 | PROCESS FOR DEVELOPING A POSITIVE PHOTORESIST | HOECHST CELANESE CORPORATION (US) | 1997-09-18 | — | — | WO | disclosed |
| WO-1996022564-A1 | METHOD OF DEVELOPING POSITIVE PHOTORESIST AND COMPOSITIONS THEREFOR | HOECHST CELANESE CORPORATION (US) | 1996-07-25 | — | — | WO | disclosed |