Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8507384 | 0.96 | — | — | |
| SCHEMBL30773 | 0.96 | — | — | |
| SCHEMBL89767 | 0.96 | — | — | |
| Bromide SCHEMBL28548996 | 0.92 | — | — | |
| Ethylene SCHEMBL8167864 | 0.92 | — | — | |
| Hydrochloric Acid SCHEMBL17242650 | 0.92 | — | — | |
| Formic Acid SCHEMBL3667111 | 0.82 | — | — | |
| Perchlorate SCHEMBL11635223 | 0.79 | — | — | |
| Sulfuric Acid SCHEMBL8518134 | 0.79 | CA5A (0.38) | — | |
| Acetic Acid SCHEMBL9812222 | 0.77 | FFAR3 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 224 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118146486-A | Polyisocyanate composition containing isocyanurate structure with low color number, and preparation method and application thereof | 万华化学集团股份有限公司 | 2024-06-07 | — | — | CN | claimed |
| EP-3169765-B1 | CLEANING COMPOSITION FOLLOWING CMP AND METHODS RELATED THERETO | CABOT MICROELECTRONICS CORP (US) | 2020-08-19 | — | — | EP | claimed |
| US-10100272-B2 | Cleaning composition following CMP and methods related thereto | CABOT MICROELECTRONICS CORPORATION (US) | 2018-10-16 | — | — | US | claimed |
| US-20170158992-A1 | CLEANING COMPOSITION FOLLOWING CMP AND METHODS RELATED THERETO | CMC MATERIALS LLC | 2017-06-08 | — | — | US | claimed |
| EP-3169765-A1 | CLEANING COMPOSITION FOLLOWING CMP AND METHODS RELATED THERETO | Cabot Microelectronics Corporation (US) | 2017-05-24 | — | — | EP | claimed |
| WO-2016069576-A1 | NON-AMINE POST-CMP COMPOSITIONS AND METHOD OF USE | ENTEGRIS, INC. (US) | 2016-05-06 | — | — | WO | claimed |
| WO-2016011331-A1 | CLEANING COMPOSITION FOLLOWING CMP AND METHODS RELATED THERETO | CABOT MICROELECTRONICS CORPORATION (US) | 2016-01-21 | — | — | WO | claimed |
| EP-0127171-B1 | DEVELOPING LIQUID FOR PHOTORESIST | KABUSHIKI KAISHA TOSHIBA (JP) | 1987-04-15 | — | — | EP | claimed |
| EP-0127171-A1 | Developing liquid for photoresist | KABUSHIKI KAISHA TOSHIBA (JP) | 1984-12-05 | — | — | EP | claimed |
| US-4117013-A | AMINES, QUATERNARY AMMONIUM COMPOUNDS, OLEFIN EPOXIDES, HYDROXYQUI(OLINES, AMINE PHENOXIDES, GLYCIDYL HALIDES AND ETHERS | UNITED TECHNOLOGIES CORPORATION (US) | 1978-09-26 | — | — | US | claimed |
| JP-62196656-A | — | — | None | — | — | JP | disclosed |
| JP-53050977-A | — | — | None | — | — | JP | disclosed |
| JP-61224424-A | — | — | None | — | — | JP | disclosed |
| JP-52064877-A | — | — | None | — | — | JP | disclosed |
| US-6413923-B1 | — | — | None | — | — | US | disclosed |
| US-4117013-A | AMINES, QUATERNARY AMMONIUM COMPOUNDS, OLEFIN EPOXIDES, HYDROXYQUI(OLINES, AMINE PHENOXIDES, GLYCIDYL HALIDES AND ETHERS | UNITED TECHNOLOGIES CORPORATION (US) | 1978-09-26 | — | — | US | disclosed |
| US-4117013-A | AMINES, QUATERNARY AMMONIUM COMPOUNDS, OLEFIN EPOXIDES, HYDROXYQUI(OLINES, AMINE PHENOXIDES, GLYCIDYL HALIDES AND ETHERS | UNITED TECHNOLOGIES CORPORATION (US) | 1978-09-26 | — | — | US | disclosed |
| JP-S5350977-A | SEMICONDUCTOR SURFACE TREATING AGENT | TOSHIBA CORP | 1978-05-09 | — | — | JP | disclosed |
| JP-S5264877-A | PRODUCTION OF SEMICONDUCTOR DEVICE | TOSHIBA CORP | 1977-05-28 | — | — | JP | disclosed |
| US-3988267-A | Quaternary hydroxyalkyl tertiary amine bases as polyurethane catalysts | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1976-10-26 | — | — | US | disclosed |