SCHEMBL308751

SCHEMBL308751

Clc1ccc(C2=NC(c3ccc(Cl)cc3Cl)(n3c(-c4ccc(Cl)cc4Cl)nc(-c4ccc(Cl)cc4Cl)c3-c3ccc(Cl)cc3Cl)N=C2c2ccc(Cl)cc2Cl)c(Cl)c1

nearest known ligand 0.38

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 3/20 0.38
DPP4 P27487 2/20 0.35
KDM4E B2RXH2 2/20 0.34
MAPK1 P28482 1/20 0.34
CRHR1 P34998 5/20 0.34
CNR1 P21554 2/20 0.34
LMNA P02545 1/20 0.33
GAA P10253 1/20 0.33
HTT P42858 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL308702 0.90 DPP4 (0.37) HSD11B1DPP4KDM4EMAPK1CNR1
SCHEMBL476565 0.81 HSD11B1 (0.42) HSD11B1DPP4KDM4EMAPK1CNR1
SCHEMBL29389827 0.81 HSD11B1 (0.42) HSD11B1DPP4KDM4EMAPK1CNR1
SCHEMBL29892510 0.72 MAPT (0.48) DPP4KDM4ECNR1GAA
SCHEMBL1869270 0.71 MGAM (0.38) KDM4EMAPK1CNR1GAA
SCHEMBL10672501 0.70 L3MBTL1 (0.39) KDM4EMAPK1LMNAGAA
SCHEMBL491055 0.69 AHR (0.41) HSD11B1KDM4ECRHR1LMNAGAA
SCHEMBL29895740 0.67 L3MBTL1 (0.43) KDM4EMAPK1
SCHEMBL29895743 0.67 L3MBTL1 (0.43) KDM4EMAPK1
SCHEMBL31734212 0.66 HSD11B1 (0.38) HSD11B1DPP4KDM4ECNR1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2154162-B1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION AND CURED MATERIAL SHOWA DENKO KK (JP) 2019-07-17 EP disclosed
US-8399569-B2 Reactive urethane compound having ether bond, curable composition, and cured material SHOWA DENKO K.K. (JP) 2013-03-19 US disclosed
EP-1866357-B1 (METH)ACRYLOYL GROUP-CONTAINING AROMATIC ISOCYANATE COMPOUND AND PRODUCTION PROCESS THEREOF SHOWA DENKO KK (JP) 2012-02-22 EP disclosed
US-8092982-B2 Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib SAMSUNG SDI CO., LTD. (KR) 2012-01-10 US disclosed
US-8044235-B2 (Meth) acryloyl group-containing aromatic isocyanate compound and production process thereof SHOWA DENKO K.K. (JP) 2011-10-25 US disclosed
EP-1812381-B1 ETHYLENICALLY UNSATURATED GROUP-CONTAINING ISOCYANATE COMPOUND AND PROCESS FOR PRODUCING THE SAME, AND REACTIVE MONOMER, REACTIVE (METH)ACRYLATE POLYMER AND ITS USE SHOWA DENKO KK (JP) 2011-02-16 EP disclosed
US-20100160557-A1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION, AND CURED MATERIAL SHOWA DENKO K.K. (JP) 2010-06-24 US disclosed
EP-2154162-A1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION AND CURED PRODUCT Showa Denko K.K. (JP) 2010-02-17 EP disclosed
US-7579066-B2 Ethylenically unsaturated group-containing isocyanate compound and process for producing the same, and reactive monomer, reactive (meth) acrylate polymer and its use SHOWA DENKO K.K. (JP) 2009-08-25 US disclosed
EP-2082994-A1 Photosensitive paste composition, barrier ribs prepared using the composition and plasma display panel comprising the barrier ribs Samsung SDI Co., Ltd. (KR) 2009-07-29 EP disclosed
US-20090186187-A1 PHOTOSENSITIVE PASTE COMPOSITION, BARRIER RIBS PREPARED USING THE COMPOSITION AND PLASMA DISPLAY PANEL COMPRISING THE BARRIER RIBS SAMSUNG SDI CO., LTD. (KR) 2009-07-23 US disclosed
US-20090054543-A1 (Meth) Acryloyl Group-Containing Aromatic Isocyanate Compound and Production Process Thereof SHOWA DENKO K.K. (JP) 2009-02-26 US disclosed
US-20080238318-A1 PHOTOSENSITIVE PASTE COMPOSITION, BARRIER RIB PREPARED USING THE COMPOSITION AND PLASMA DISPLAY PANEL COMPRISING THE BARRIER RIB SAMSUNG SDI CO., LTD. (KR) 2008-10-02 US disclosed
US-20080132597-A1 Ethylenically Unsaturated Group-Containing Isocyanate Compound and Process for Producing the Same, and Reactive Monomer, Reactive (Meth) Acrylate Polymer and its Use RESONAC CORPORATION (JP) 2008-06-05 US disclosed
US-20080026320-A1 PHOTOSENSITIVE PASTE COMPOSITION, BARRIER RIB PREPARED USING THE COMPOSITION AND PLASMA DISPLAY PANEL COMPRISING THE BARRIER RIB SAMSUNG SDI CO., LTD. (KR) 2008-01-31 US disclosed
EP-1870771-A2 Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib Samsung SDI Co., Ltd. (KR) 2007-12-26 EP disclosed
US-20040157140-A1 Photosensitive coloring composition, color filter using the composition and method of producing the same SHOWA DENKO K.K. (JP) 2004-08-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090054543-A1 (Meth) Acryloyl Group-Containing Aromatic Isocyanate Compound and Production Process Thereof PRMT5, ACR, PRMT1 HSD11B1 897/4885DPP4 3469/4885KDM4E 620/4885
US-20100160557-A1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION, AND CURED MATERIAL UNC119, MLLT1, H1-0 HSD11B1 2984/4885DPP4 4827/4885KDM4E 263/4885
US-20080132597-A1 Ethylenically Unsaturated Group-Containing Isocyanate Compound and Process for Producing the Same, and Reactive Monomer, Reactive (Meth) Acrylate Polymer and its Use ACAD9, ELOVL6, ELOVL5 HSD11B1 882/4885DPP4 4774/4885KDM4E 2908/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.