SCHEMBL498530

SCHEMBL498530

CCc1ccccc1COCc1ccccc1CC

nearest known ligand 0.44

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 4/20 0.44
GABRB2 P47870 4/20 0.44
L3MBTL1 Q9Y468 3/20 0.42
MAPT P10636 2/20 0.42
NPSR1 Q6W5P4 1/20 0.42
TSHR P16473 1/20 0.42
MGLL Q99685 1/20 0.40
IDO1 P14902 3/20 0.38
TP53 P04637 1/20 0.38
KDM4E B2RXH2 1/20 0.37
SGMS2 Q8NHU3 1/20 0.36
HPGD P15428 1/20 0.36
ATM Q13315 1/20 0.36
SLC6A2 P23975 1/20 0.36
SLC6A4 P31645 1/20 0.36
NISCH Q9Y2I1 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene Glycol SCHEMBL7755505 0.91 GABRA1 (0.43) GABRA1GABRB2L3MBTL1MAPTNPSR1
SCHEMBL8750546 0.90 L3MBTL1 (0.44) GABRA1GABRB2L3MBTL1MAPTNPSR1
SCHEMBL14394524 0.89 TSHR (0.62) L3MBTL1MAPTTSHRIDO1TP53
SCHEMBL24925788 0.86 GABRA1 (0.43) GABRA1GABRB2L3MBTL1MAPTNPSR1
Di(Hydroxyethyl)Ether SCHEMBL11297658 0.85 TSHR (0.39) GABRA1GABRB2L3MBTL1MAPTNPSR1
SCHEMBL17624866 0.85 TSHR (0.46) GABRA1GABRB2TSHRIDO1TP53
SCHEMBL2792022 0.84 GABRA1 (0.44) GABRA1GABRB2L3MBTL1MAPTNPSR1
SCHEMBL36294 0.83 GABRA1 (0.58) GABRA1GABRB2L3MBTL1MAPTNPSR1
SCHEMBL25425763 0.83 GABRA1 (0.58) GABRA1GABRB2L3MBTL1MAPTNPSR1
SCHEMBL29390847 0.83 GABRA1 (0.58) GABRA1GABRB2L3MBTL1MAPTNPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 543 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113817366-B Liquid composition, and method for producing film and laminate using same AGC株式会社 2022-08-23 CN claimed
CN-113817366-A Liquid composition, and method for producing film and laminate using same AGC株式会社 2021-12-21 CN claimed
US-11192853-B2 Separation method and method for producing isocyanate ASAHI KASEI CHEMICALS CORPORATION (JP) 2021-12-07 US claimed
US-11174411-B2 Liquid composition, and method for producing a film and a laminate by using the liquid composition AGC Inc. (JP) 2021-11-16 US claimed
EP-0798036-B1 Highly permeable composite reverse osmosis membrane and a reverse osmosis membrane module using the same NITTO DENKO CORP (JP) 2003-09-24 EP claimed
US-6024873-A Highly permeable composite reverse osmosis membrane and a reverse osmosis membrane module using the same NITTO DENKO CORPORATION (JP) 2000-02-15 US claimed
EP-0798036-A2 Highly permeable composite reverse osmosis membrane and a reverse osmosis membrane module using the same NITTO DENKO CORPORATION (JP) 1997-10-01 EP claimed
US-4929533-A Using light sensitive diazo resin and high molecular weight copolymer FUJI PHOTO FILM CO., LTD. (JP) 1990-05-29 US claimed
US-20260117014-A1 RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, METHOD FOR PRODUCING STRUCTURE INCLUDING PHASE-SEPARATED STRUCTURE, AND BLOCK COPOLYMER TOKYO OHKA KOGYO CO LTD (JP) 2026-04-30 US disclosed
US-20260002045-A1 BASE MATERIAL AND METHOD FOR PRODUCING STRUCTURE INCLUDING PHASE-SEPARATED STRUCTURE TOKYO OHKA KOGYO CO LTD (JP) 2026-01-01 US disclosed
US-20250370334-A1 COMPLEX, INORGANIC PHOTORESIST COMPOSITION COMPRISING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-12-04 US disclosed
US-20250362597-A1 RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-11-27 US disclosed
US-20250355354-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN TOKYO OHKA KOGYO CO LTD (JP) 2025-11-20 US disclosed
US-20250354093-A1 THINNER COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE USING THINNER COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-11-20 US disclosed
US-4110404-A Hydrocarbonylation CELANESE CORPORATION (US) 1978-08-29 US disclosed
US-4060690-A COBALT CONTAINING CATALYST DYNAMIT NOBEL AKTIENGESELLSCHAFT (DT) 1977-11-29 US disclosed
US-4020109-A POLYMERIZATION AND ALDOL CONDENSATION INHIBITION UNION OIL COMPANY OF CALIFORNIA (US) 1977-04-26 US disclosed
US-3974202-A CARBON MONOXIDE, BENZYL HALIDE AND AN ALCOHOL; COBALT OR IRON CARBONYL CATALYST DYNAMIT NOBEL AKTIENGESELLSCHAFT (DT) 1976-08-10 US disclosed
US-3965192-A Hydrocarbonylation process UNION OIL COMPANY OF CALIFORNIA (US) 1976-06-22 US disclosed
US-3931088-A ADHESIVE COMPOSITION CONSISTING OF POLYVINYLALCOHOL SOLUTION OR POLYVINYLACETATE LATEX MODIFIED WITH HYDROPHOBIC SOLUTION OF ISOCYANATE COMPOUND KURARAY CO., LTD. (JA) 1976-01-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260117014-A1 RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, METHOD FOR PRODUCING STRUCTURE INCLUDING PHASE-SEPARATED STRUCTURE, AND BLOCK COPOLYMER SMC2, MBD2, SMC4 GABRA1 1508/4885GABRB2 1011/4885L3MBTL1 496/4885
US-20260002045-A1 BASE MATERIAL AND METHOD FOR PRODUCING STRUCTURE INCLUDING PHASE-SEPARATED STRUCTURE RAD1, CCNB1, SMC1A GABRA1 1189/4885GABRB2 1894/4885L3MBTL1 165/4885
US-11192853-B2 Separation method and method for producing isocyanate IDH3A, IDH3B, CA9 GABRA1 2967/4885GABRB2 2372/4885L3MBTL1 4030/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.