Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5002841 | 0.83 | MEN1 (0.36) | MEN1KMT2ALMNA | |
| SCHEMBL4999754 | 0.81 | ALDH1A1 (0.33) | MEN1KMT2ALMNA | |
| SCHEMBL5002934 | 0.79 | MEN1 (0.34) | MEN1KMT2ALMNA | |
| SCHEMBL103781 | 0.78 | MEN1 (0.36) | MEN1KMT2ALMNA | |
| SCHEMBL105577 | 0.78 | LMNA (0.37) | MEN1KMT2ALMNA | |
| SCHEMBL5002907 | 0.77 | MEN1 (0.35) | MEN1KMT2ALMNA | |
| SCHEMBL4999596 | 0.77 | MEN1 (0.35) | MEN1KMT2ALMNA | |
| SCHEMBL27572715 | 0.75 | — | — | |
| SCHEMBL4999949 | 0.68 | MEN1 (0.32) | MEN1KMT2ALMNA | |
| SCHEMBL4999829 | 0.67 | OPRK1 (0.36) | MEN1KMT2ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-100415752-C | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORP (JP) | 2008-09-03 | — | — | CN | disclosed |
| US-7413775-B2 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION (JP) | 2008-08-19 | — | — | US | disclosed |
| CN-100367472-C | Material for insulating film containing organic silane compound, method for producing the same, and semiconductor device | TOKURI CO LTD (JP) | 2008-02-06 | — | — | CN | disclosed |
| CN-100335488-C | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORP (JP) | 2007-09-05 | — | — | CN | disclosed |
| US-7160625-B2 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION (JP) | 2007-01-09 | — | — | US | disclosed |
| CN-1803805-A | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORP (JP) | 2006-07-19 | — | — | CN | disclosed |
| CN-1793151-A | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORP (JP) | 2006-06-28 | — | — | CN | disclosed |
| US-20060127683-A1 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION | 2006-06-15 | — | — | US | disclosed |
| US-20030180550-A1 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION | 2003-09-25 | — | — | US | disclosed |
| CN-1437228-A | Material for insulating film containing organic silane compound, method for producing the same, and semiconductor device | TOKURI CO LTD (JP) | 2003-08-20 | — | — | CN | disclosed |