SCHEMBL500156

SCHEMBL500156

O=C(O)C(CN1CCCC1)C1CCOC1=O

nearest known ligand 0.35

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.34
CHRM2 P08172 1/20 0.33
CHRM4 P08173 1/20 0.33
CHRM5 P08912 1/20 0.33
CHRM1 P11229 1/20 0.33
CHRM3 P20309 1/20 0.33
MITF O75030 1/20 0.33
HTT P42858 1/20 0.33
RAB9A P51151 1/20 0.33
GFER P55789 1/20 0.33
PAX8 Q06710 1/20 0.33
ATM Q13315 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
SMYD3 Q9H7B4 1/20 0.32
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
HSD17B10 Q99714 1/20 0.31
HPGD P15428 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3531187 0.78 KDM4E (0.33) ALDH1A1HSD17B10HPGD
SCHEMBL500610 0.70 MEN1 (0.42) ALDH1A1HTTSMN1; SMN2MEN1KMT2A
SCHEMBL500157 0.70 L3MBTL1 (0.35) ALDH1A1HPGD
SCHEMBL27330830 0.70 IDUA (0.39)
SCHEMBL65466 0.65 METAP1 (0.38) CHRM5
SCHEMBL12014397 0.64 ADRA2C (0.41) CHRM5
SCHEMBL12014382 0.64 ALDH1A1 (0.46) ALDH1A1SMN1; SMN2MEN1KMT2AHSD17B10
SCHEMBL12014379 0.63 ALDH1A1 (0.48) ALDH1A1SMN1; SMN2MEN1KMT2AHSD17B10
SCHEMBL4833162 0.63 LMNA (0.39)
SCHEMBL13986503 0.63 LMNA (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8105760-B2 Patterning process and pattern surface coating composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-31 US disclosed
US-20090053657-A1 PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-26 US disclosed
US-7189493-B2 Polymer, positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-13 US disclosed