Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRA2C | P18825 | 2/20 | 0.41 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.41 |
| ▸ | METAP1 | P53582 | 2/20 | 0.41 |
| ▸ | CHRNA7 | P36544 | 6/20 | 0.38 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.35 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.35 |
| ▸ | ADRA1D | P25100 | 1/20 | 0.35 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.35 |
| ▸ | ADRA1B | P35368 | 1/20 | 0.35 |
| ▸ | SCN1A | P35498 | 1/20 | 0.35 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.35 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.35 |
| ▸ | KCNH3 | Q9ULD8 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL65466 | 0.98 | METAP1 (0.38) | ADRA2CCHRM5METAP1CHRNA7ADRA2A | |
| SCHEMBL12014396 | 0.85 | ADRA2A (0.41) | ADRA2CADRA2AADRA2BADRA1AKCNH3 | |
| SCHEMBL31708223 | 0.80 | KCNH3 (0.32) | KCNH3 | |
| SCHEMBL9818144 | 0.71 | KCNH3 (0.38) | KCNH3 | |
| SCHEMBL3686947 | 0.69 | CEL (0.34) | KCNH3 | |
| SCHEMBL23914078 | 0.68 | CHRNA7 (0.39) | ADRA2CCHRM5METAP1CHRNA7 | |
| SCHEMBL23914077 | 0.68 | CHRNA7 (0.39) | ADRA2CCHRM5METAP1CHRNA7 | |
| Pimeclone SCHEMBL545058 | 0.68 | CHRM5 (0.47) | ADRA2CCHRM5METAP1CHRNA7 | |
| SCHEMBL10907196 | 0.67 | — | — | |
| SCHEMBL1927524 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210317099-A1 | SAFER, POTENT, AND FAST ACTING ANTIMICROBIAL AGENTS | PURDUE RESEARCH FOUNDATION (US) | 2021-10-14 | — | — | US | disclosed |
| US-20170131632-A1 | ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD | JSR CORPORATION (JP) | 2017-05-11 | — | — | US | disclosed |
| US-20170131632-A1 | ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD | JSR CORPORATION (JP) | 2017-05-11 | — | — | US | disclosed |
| US-9588423-B2 | Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method | JSR CORPORATION (JP) | 2017-03-07 | — | — | US | disclosed |
| US-9588423-B2 | Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method | JSR CORPORATION (JP) | 2017-03-07 | — | — | US | disclosed |
| US-20150079520-A1 | ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD | JSR CORPORATION (JP) | 2015-03-19 | — | — | US | disclosed |
| US-20150079520-A1 | ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD | JSR CORPORATION (JP) | 2015-03-19 | — | — | US | disclosed |
| US-8728707-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-05-20 | — | — | US | disclosed |
| US-8728707-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-05-20 | — | — | US | disclosed |
| US-8568956-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-29 | — | — | US | disclosed |
| US-8568956-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-29 | — | — | US | disclosed |
| US-20130022909-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022909-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120219899-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219899-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170131632-A1 | ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD | RER1, RFC4, RFC2 | ADRA2C 3550/4885CHRM5 3512/4885METAP1 4515/4885 |
| US-20150079520-A1 | ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD | RER1, RFC4, RFC2 | ADRA2C 3550/4885CHRM5 3512/4885METAP1 4515/4885 |
| US-20210317099-A1 | SAFER, POTENT, AND FAST ACTING ANTIMICROBIAL AGENTS | MIF, LTA, MGAM | ADRA2C 3419/4885CHRM5 4403/4885METAP1 890/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.