SCHEMBL501727

SCHEMBL501727

Oc1ccc([S+](c2ccc(O)cc2)c2ccc(O)cc2)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 3/20 0.57
CA3 P07451 3/20 0.57
CA14 Q9ULX7 3/20 0.57
HSD17B10 Q99714 3/20 0.57
MAPT P10636 3/20 0.57
ALDH1A1 P00352 2/20 0.57
CYP3A4 P08684 2/20 0.57
HIF1A Q16665 2/20 0.57
MEN1 O00255 2/20 0.57
KMT2A Q03164 2/20 0.57
CA12 O43570 2/20 0.57
CA1 P00915 2/20 0.57
CA2 P00918 2/20 0.57
CA4 P22748 2/20 0.57
CA9 Q16790 2/20 0.57
LMNA P02545 2/20 0.57
HPGD P15428 2/20 0.57
KDM4E B2RXH2 1/20 0.57
NPC1 O15118 1/20 0.57
GMNN O75496 1/20 0.57

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL11133148 0.97 ALOX15 (0.53) ALOX15CA3CA14HSD17B10MAPT
Hydrochloric Acid SCHEMBL2286648 0.97 ALOX15 (0.53) ALOX15CA3CA14HSD17B10MAPT
SCHEMBL502108 0.88 CA12 (0.53) ALOX15CA3CA14HSD17B10MAPT
SCHEMBL158163 0.88 CA12 (0.53) ALOX15CA3CA14HSD17B10MAPT
SCHEMBL12639140 0.86 MAPK1 (0.50) ALOX15CA3CA14HSD17B10MAPT
SCHEMBL6117392 0.86 GAA (0.45) ALOX15CA3CA14HSD17B10MAPT
SCHEMBL12770101 0.86 ACHE (0.68) ALOX15CA3CA14HSD17B10MAPT
Water SCHEMBL548229 0.86 CA12 (0.50) ALOX15CA3CA14HSD17B10MAPT
SCHEMBL10022934 0.86 ACHE (0.68) ALOX15CA3CA14HSD17B10MAPT
Hydrochloric Acid SCHEMBL3142697 0.86 CA12 (0.50) ALOX15CA3CA14HSD17B10MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 423 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120029006-A Photosensitive resin composition, photosensitive dry film, cured film, circuit board and display module 杭州福斯特电子材料有限公司 2025-05-23 CN claimed
EP-1710230-B1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHINETSU CHEMICAL CO (JP) 2013-08-14 EP claimed
US-6498200-B1 OXIRANE OR OXETANE RING COMPOUND, ORGANIC PEROXIDE, ONIUM SALT CATALYST, AND ALKALINE FILLER; CURES RAPIDLY; STABLE DOES NOT CAUSE INCREASE IN ELECTROCONDUCTIVITY OR CORROSION; SEALANT, BINDER, ENCAPSULATING AGENT, DIELECTRIC FILM NAMICS CORPORATION (JP) 2002-12-24 US claimed
US-6051370-A Radiation-sensitive mixture BASF AKTIENGESELLSCHAFT (DE) 2000-04-18 US claimed
EP-0553737-B1 Radiation-sensitive composition BASF AG (DE) 1999-09-22 EP claimed
JP-3148256-A None JP disclosed
EP-4748893-A1 PHOTOCURABLE RESIN COMPOSITION, ADHESIVE, SEALING MATERIAL, COATING AGENT, CURED PRODUCT, SEMICONDUCTOR DEVICE, ELECTRONIC COMPONENT, AND CURING, BONDING, SEALING, AND COATING METHODS USING PHOTOCURABLE RESIN COMPOSITION Namics Corporation (JP) 2026-05-27 EP disclosed
US-20260116071-A1 METHOD OF MANUFACTURING LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD CANON KK (JP) 2026-04-30 US disclosed
US-20260093177-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-02 US disclosed
EP-4696511-A1 INK-JET RECORDING HEAD Canon Kabushiki Kaisha (JP) 2026-02-18 EP disclosed
US-20260042917-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
US-20260042294-A1 INK-JET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
US-5914219-A Radiation-sensitive mixture and the production of relief structures having improved contrast BASF AKTIENGESELLSCHAFT (DE) 1999-06-22 US disclosed
US-5783354-A QUATERNARY AMMONIUM COMPOUNDS BASF AKTIENGESELLSCHAFT (DE) 1998-07-21 US disclosed
US-5759750-A Radiation-sensitive mixture BASF AKTIENGESELLSCHAFT (DE) 1998-06-02 US disclosed
US-5679496-A CONTAINING SULFONIUM SALT HAVING TERT-BUTOXYCARBONYLMETHOXY GROUP(S) AS ACID LABILE GROUPS; SENSITIVITY, RESOLUTION, ETCH AND HEAT RESISTANCE SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-10-21 US disclosed
US-5204216-A RADIATION-SENSITIVE MIXTURE BASF AKTIENGESELLSCHAFT (DE) 1993-04-20 US disclosed
US-5191124-A Photoinitiators for Cationic Polymerization BASF AKTIENGESELLSCHAFT (DE) 1993-03-02 US disclosed
US-5159088-A Photinitiators for cationic polymerization BASF AKTIENGESELLSCHAFT (DE) 1992-10-27 US disclosed
JP-H03148256-A NEW SULFONIUM SALT USEFUL AS PHOTOPOLYMERIZATION INITIATOR BASF AG 1991-06-25 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260042917-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD MLLT3, OR10J3, RFT1 ALOX15 1932/4885CA3 671/4885CA14 1176/4885
US-20260093177-A1 PATTERNING PROCESS ARFGAP1, ARF1, ARF4 ALOX15 1133/4885CA3 191/4885CA14 529/4885
US-20260116071-A1 METHOD OF MANUFACTURING LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD ASIC1, PTGER1, PELP1 ALOX15 446/4885CA3 595/4885CA14 1386/4885
US-20260042294-A1 INK-JET RECORDING HEAD SEM1, ASIC1, C9 ALOX15 2415/4885CA3 28/4885CA14 340/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.