Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.58 |
| ▸ | LMNA | P02545 | 2/20 | 0.49 |
| ▸ | THRB | P10828 | 2/20 | 0.49 |
| ▸ | MAPT | P10636 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.49 |
| ▸ | GAA | P10253 | 1/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.49 |
| ▸ | ATM | Q13315 | 1/20 | 0.49 |
| ▸ | TNF | P01375 | 2/20 | 0.48 |
| ▸ | POLB | P06746 | 1/20 | 0.47 |
| ▸ | TSHR | P16473 | 1/20 | 0.47 |
| ▸ | GLA | P06280 | 1/20 | 0.47 |
| ▸ | THRA | P10827 | 1/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.46 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.46 |
| ▸ | HTR2A | P28223 | 1/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | SCN1A | P35498 | 1/20 | 0.46 |
| ▸ | HTR2B | P41595 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL5844774 | 0.98 | ALDH1A1 (0.60) | ALDH1A1LMNATHRBMAPTKMT2A | |
| SCHEMBL10174955 | 0.90 | ALDH1A1 (0.56) | ALDH1A1LMNATHRBMAPTKMT2A | |
| SCHEMBL146765 | 0.89 | ALDH1A1 (0.54) | ALDH1A1LMNATHRBMAPTKMT2A | |
| SCHEMBL142816 | 0.88 | DGKA (0.57) | ALDH1A1LMNATHRBMAPTKMT2A | |
| SCHEMBL14505693 | 0.88 | DGKA (0.57) | ALDH1A1LMNATHRBMAPTKMT2A | |
| SCHEMBL501472 | 0.88 | DGKA (0.57) | ALDH1A1LMNATHRBMAPTKMT2A | |
| SCHEMBL18697251 | 0.88 | DGKA (0.57) | ALDH1A1LMNATHRBMAPTKMT2A | |
| SCHEMBL145675 | 0.88 | DGKA (0.57) | ALDH1A1LMNATHRBMAPTKMT2A | |
| SCHEMBL22451880 | 0.88 | DGKA (0.57) | ALDH1A1LMNATHRBMAPTKMT2A | |
| SCHEMBL145889 | 0.88 | DGKA (0.57) | ALDH1A1LMNATHRBMAPTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7034020-B2 | Derivatives of butyric acid and uses thereof | THE UNIVERSITY OF ARKANSAS FOR MEDICAL SCIENCE (US) | 2006-04-25 | — | — | US | claimed |
| US-20040127564-A1 | Derivatives of butyric acid and uses thereof | THE UNIVERSITY OF ARKANSAS FOR MEDICAL SCIENCES | 2004-07-01 | — | — | US | claimed |
| US-20020143056-A1 | Derivatives of butyric acid and uses thereof | THE UNIVERSITY OF ARKANSAS FOR MEDICAL SCIENCES | 2002-10-03 | — | — | US | claimed |
| WO-2000073257-A1 | DERIVATIVES OF BUTYRIC ACID AND USES THEREOF | THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ARKANSAS (US) | 2000-12-07 | — | — | WO | claimed |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| US-11720018-B2 | Chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-08 | — | — | US | disclosed |
| US-20230205083-A1 | SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-29 | — | — | US | disclosed |
| US-20220127225-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-04-28 | — | — | US | disclosed |
| US-20210188770-A1 | ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-06-24 | — | — | US | disclosed |
| US-20210179554-A1 | ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-06-17 | — | — | US | disclosed |
| US-20210149301-A1 | ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-05-20 | — | — | US | disclosed |
| US-7034020-B2 | Derivatives of butyric acid and uses thereof | THE UNIVERSITY OF ARKANSAS FOR MEDICAL SCIENCE (US) | 2006-04-25 | — | — | US | disclosed |
| US-20040127564-A1 | Derivatives of butyric acid and uses thereof | THE UNIVERSITY OF ARKANSAS FOR MEDICAL SCIENCES | 2004-07-01 | — | — | US | disclosed |
| US-6749988-B2 | PREVENTING A RESIST FILM FROM THINNING AND ALSO FOR ENHANCING THE RESOLUTION AND FOCUS MARGIN OF RESIST; HETEROCYCLIC AMINE COMPOUNDS HAVING A HYDRATING GROUP SUCH AS A HYDROXY, ETHER, ESTER, CARBONYL, CARBONATE GROUP OR LACTONE RING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-06-15 | — | — | US | disclosed |
| US-6664394-B2 | As inactivator of antigen- specific T cells is useful in the prophylaxis or therapy of autoimmune diseases, disorders involving an autoimmune component or neoplastic diseases | THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ARKANSAS | 2003-12-16 | — | — | US | disclosed |
| US-20020143056-A1 | Derivatives of butyric acid and uses thereof | THE UNIVERSITY OF ARKANSAS FOR MEDICAL SCIENCES | 2002-10-03 | — | — | US | disclosed |
| US-20020098443-A1 | Amine compounds, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-07-25 | — | — | US | disclosed |
| US-6407107-B1 | 4-(MORPHOLINO)ALKYL BUTANAMIDE DERIVATIVES; AUTOIMMUNE DISEASES; ANTICARCINOGENIC AGENTS | THE BOARD OF TRUSTEES OF THE UNVERSITY OF ARKANSAS | 2002-06-18 | — | — | US | disclosed |
| WO-2000073257-A1 | DERIVATIVES OF BUTYRIC ACID AND USES THEREOF | THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ARKANSAS (US) | 2000-12-07 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (9 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230205083-A1 | SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS | SLC6A9, SLC6A5, REN | ALDH1A1 3949/4885LMNA 2393/4885THRB 4707/4885 |
| US-20020098443-A1 | Amine compounds, resist compositions and patterning process | PARG, EHMT1, EHMT2 | ALDH1A1 4186/4885LMNA 578/4885THRB 3467/4885 |
| US-20210179554-A1 | ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SLC6A5, LIFR, SLC6A9 | ALDH1A1 4242/4885LMNA 1042/4885THRB 4423/4885 |
| US-20220127225-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | CACNA1F, SLC6A5, IDUA | ALDH1A1 3860/4885LMNA 942/4885THRB 4466/4885 |
| US-20020143056-A1 | Derivatives of butyric acid and uses thereof | CD4, NFATC1, GABRA4 | ALDH1A1 858/4885LMNA 2350/4885THRB 2013/4885 |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | IDUA, SLC6A5, SLC6A9 | ALDH1A1 4322/4885LMNA 1080/4885THRB 4385/4885 |
| US-20210188770-A1 | ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SLC6A5, LIFR, SLC6A9 | ALDH1A1 4242/4885LMNA 1042/4885THRB 4423/4885 |
| US-20210149301-A1 | ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | IDUA, SLC6A5, SLC6A9 | ALDH1A1 4322/4885LMNA 1080/4885THRB 4385/4885 |
| US-20040127564-A1 | Derivatives of butyric acid and uses thereof | CD4, NFATC1, GABRA4 | ALDH1A1 849/4885LMNA 2318/4885THRB 2048/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.