SCHEMBL503327

SCHEMBL503327

OC12C[C]3CC(C1)CC(O)(C3)C2

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL987369 0.83 GRIN2D (0.31)
SCHEMBL5708781 0.83
SCHEMBL14633816 0.79
SCHEMBL2536300 0.79 HSD11B1 (0.34) PKM
SCHEMBL14633302 0.75
SCHEMBL216451 0.75 PKM (0.37) PKM
SCHEMBL2537545 0.74 ABL1 (0.36)
SCHEMBL1905331 0.69
SCHEMBL424435 0.68 PKM (0.42) PKM
SCHEMBL327129 0.65 GRIN1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 256 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2554555-B1 METHODS FOR PRODUCING AN ADAMANTYL (METH)ACRYLATE MONOMER AND A (METH)ACRYLIC COPOLYMER THAT CONTAINS REPEATING UNITS DERIVED FROM THE MONOMER MITSUBISHI GAS CHEMICAL CO (JP) 2019-09-18 EP claimed
CN-102884094-B Adamantyl (meth) acrylic monomer and (meth) acrylic polymer containing the same in repeating unit MITSUBISHI GAS CHEMICAL CO 2015-03-11 CN claimed
US-8846840-B2 Adamantyl (meth)acrylic monomer and (meth)acrylic polymer containing the same as repeating unit MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-09-30 US claimed
EP-2554555-A1 ADAMANTYL (METH)ACRYLATE MONOMER AND (METH)ACRYLIC POLYMER THAT CONTAINS REPEATING UNITS DERIVED FROM THE MONOMER Mitsubishi Gas Chemical Company, Inc. (JP) 2013-02-06 EP claimed
US-20130023638-A1 ADAMANTYL (METH)ACRYLIC MONOMER AND (METH)ACRYLIC POLYMER CONTAINING THE SAME AS REPEATING UNIT MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-01-24 US claimed
CN-102884094-A Adamantyl (meth) acrylic monomer and (meth) acrylic polymer containing the same in repeating unit MITSUBISHI GAS CHEMICAL CO 2013-01-16 CN claimed
US-7220532-B2 Chemical amplification type resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-05-22 US claimed
US-7175963-B2 Chemical amplification type positive resist composition and a resin therefor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-02-13 US claimed
US-7160669-B2 Chemical amplification type resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-01-09 US claimed
US-7132218-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-11-07 US claimed
US-6846609-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-01-25 US claimed
US-6818379-B2 SULFONIUM SALT REPRESENTED BY THE FOLLOWING FORMULA (I): WHEREIN Q1, Q2 AND Q3 EACH INDEPENDENTLY REPRESENT HYDROGEN, HYDROXY, ALKYL HAVING 1 TO 6 CARBON ATOMS, OR ALKOXY HAVING 1 TO 6 CARBON ATOMS, BUT ALL OF Q1, Q2 AND Q3 ARE NOT THE SAME; SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-16 US claimed
US-20040191674-A1 Chemical amplification resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-09-30 US claimed
US-20040138353-A1 Chemical amplification type resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-07-15 US claimed
US-20040029037-A1 Amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-02-12 US claimed
US-20030148211-A1 Sulfonium salt and use thereof SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-08-07 US claimed
US-20030113661-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-06-19 US claimed
US-20030068573-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-10 US claimed
US-6495306-B2 CONTAINING DIHYDROXY-1-ADAMANTYL (METH)ACRYLATE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-12-17 US claimed
US-20010014428-A1 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-16 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130023638-A1 ADAMANTYL (METH)ACRYLIC MONOMER AND (METH)ACRYLIC POLYMER CONTAINING THE SAME AS REPEATING UNIT METTL3, METTL16, METTL14 PKM 3146/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.