Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.47 |
| ▸ | S1PR2 | O95136 | 1/20 | 0.46 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.46 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.46 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | FDPS | P14324 | 4/20 | 0.39 |
| ▸ | GPR84 | Q9NQS5 | 3/20 | 0.39 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.39 |
| ▸ | FAAH | O00519 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | LCK | P06239 | 1/20 | 0.38 |
| ▸ | PPARD | Q03181 | 1/20 | 0.38 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.38 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27915805 | 0.98 | LMNA (0.50) | LMNATP53S1PR2S1PR1S1PR3 | |
| SCHEMBL29002116 | 0.94 | ALDH1A1 (0.43) | LMNATP53S1PR2S1PR1S1PR3 | |
| SCHEMBL28409630 | 0.90 | TP53 (0.50) | LMNATP53S1PR2S1PR1S1PR3 | |
| SCHEMBL28338902 | 0.90 | TP53 (0.50) | LMNATP53S1PR2S1PR1S1PR3 | |
| SCHEMBL21659085 | 0.90 | LMNA (0.50) | LMNATP53S1PR2S1PR1S1PR3 | |
| SCHEMBL10784604 | 0.90 | LMNA (0.50) | LMNATP53S1PR2S1PR1S1PR3 | |
| SCHEMBL27000192 | 0.90 | TP53 (0.48) | LMNATP53S1PR2S1PR1S1PR3 | |
| SCHEMBL30544586 | 0.89 | LMNA (0.42) | LMNATP53S1PR2S1PR1S1PR3 | |
| SCHEMBL8813255 | 0.88 | TP53 (0.52) | LMNATP53S1PR2S1PR1S1PR3 | |
| SCHEMBL9342210 | 0.86 | CA2 (0.50) | LMNATP53S1PR2S1PR1S1PR3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9354523-B2 | Composition for resist pattern-refinement, and fine pattern-forming method | JSR CORPORATION (JP) | 2016-05-31 | — | — | US | disclosed |
| US-20160011513-A1 | COMPOSITION FOR FORMING FINE RESIST PATTERN, AND FINE PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2016-01-14 | — | — | US | disclosed |
| US-8809476-B2 | Polymer | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20140147794-A1 | METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2014-05-29 | — | — | US | disclosed |
| US-8435718-B2 | Upper layer-forming composition and photoresist patterning method | JSR CORPORATION (JP) | 2013-05-07 | — | — | US | disclosed |
| US-8389202-B2 | Polymer, radiation-sensitive composition, monomer, and method of producing compound | JSR CORPORATION (JP) | 2013-03-05 | — | — | US | disclosed |
| US-20130053526-A1 | POLYMER | JSR CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| US-8377627-B2 | Compound and radiation-sensitive composition | JSR CORPORATION (JP) | 2013-02-19 | — | — | US | disclosed |
| US-8334087-B2 | Polymer, radiation-sensitive composition, monomer, and method of producing compound | JSR CORPORATION (JP) | 2012-12-18 | — | — | US | disclosed |
| US-20120178024-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | JSR CORPORATION (JP) | 2012-07-12 | — | — | US | disclosed |
| US-20120171613-A1 | UPPER LAYER FILM-FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2012-07-05 | — | — | US | disclosed |
| EP-1950610-B1 | IMMERSION LITHOGRAPHIC COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2012-05-02 | — | — | EP | disclosed |
| US-20120028198-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| US-7977442-B2 | Radiation-sensitive composition, polymer and monomer | JSR CORPORATION (JP) | 2011-07-12 | — | — | US | disclosed |
| US-20110117489-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2011-05-19 | — | — | US | disclosed |
| US-20100331440-A1 | RADIATION-SENSITIVE COMPOSITION, POLYMER AND MONOMER | JSR CORPORATION (JP) | 2010-12-30 | — | — | US | disclosed |
| US-20100310987-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | JSR CORPORATION (JP) | 2010-12-09 | — | — | US | disclosed |
| US-20100003615-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2010-01-07 | — | — | US | disclosed |
| EP-2100870-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | JSR Corporation (JP) | 2009-09-16 | — | — | EP | disclosed |
| EP-1950610-A1 | COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2008-07-30 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110117489-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | ERCC2, RAD51, ATM | LMNA 634/4885TP53 92/4885S1PR2 2743/4885 |
| US-20100331440-A1 | RADIATION-SENSITIVE COMPOSITION, POLYMER AND MONOMER | ALG1, MRE11, PCNA | LMNA 995/4885TP53 2754/4885S1PR2 1372/4885 |
| US-20120178024-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | RAD51, PYM1, MRE11 | LMNA 2617/4885TP53 3000/4885S1PR2 926/4885 |
| US-20100310987-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | RAD1, FRG1, RAD51 | LMNA 390/4885TP53 2499/4885S1PR2 2960/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.