Known targets — ChEMBL curated mechanism
ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHKA known ✓ | P35790 | 1/20 | 0.43 |
| ▸ | ACHE known ✓ | P22303 | 2/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.57 |
| ▸ | RAB9A | P51151 | 3/20 | 0.57 |
| ▸ | NPC1 | O15118 | 2/20 | 0.57 |
| ▸ | POLB | P06746 | 1/20 | 0.57 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.50 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.50 |
| ▸ | CA1 | P00915 | 2/20 | 0.46 |
| ▸ | CA2 | P00918 | 2/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.43 |
| ▸ | LMNA | P02545 | 2/20 | 0.43 |
| ▸ | HTT | P42858 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.42 |
| ▸ | HPGD | P15428 | 3/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.42 |
| ▸ | MITF | O75030 | 1/20 | 0.42 |
| ▸ | GLA | P06280 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL30982171 | 1.00 | SMN1; SMN2 (0.57) | SMN1; SMN2RAB9ANPC1POLBCYP2D6 | |
| SCHEMBL2469671 | 0.98 | RAB9A (0.53) | SMN1; SMN2RAB9ANPC1POLBCYP2D6 | |
| SCHEMBL29519716 | 0.98 | RAB9A (0.53) | SMN1; SMN2RAB9ANPC1POLBCYP2D6 | |
| Hydrochloric Acid SCHEMBL637319 | 0.96 | RAB9A (0.52) | SMN1; SMN2RAB9ANPC1POLBCYP2D6 | |
| Hydrochloric Acid SCHEMBL29754142 | 0.96 | RAB9A (0.52) | SMN1; SMN2RAB9ANPC1POLBCYP2D6 | |
| Bromide SCHEMBL5763149 | 0.83 | KMT2A (0.49) | SMN1; SMN2RAB9ANPC1POLBCYP2D6 | |
| Hydrochloric Acid SCHEMBL28524885 | 0.81 | NPC1 (0.46) | SMN1; SMN2RAB9ANPC1POLBCYP2D6 | |
| Bromide SCHEMBL6229520 | 0.80 | NPC1 (0.63) | SMN1; SMN2RAB9ANPC1POLBCYP2D6 | |
| Hydrochloric Acid SCHEMBL2005677 | 0.80 | NPC1 (0.44) | SMN1; SMN2RAB9ANPC1POLBCYP2D6 | |
| Bromide SCHEMBL9300900 | 0.79 | KDM4E (0.46) | SMN1; SMN2RAB9ANPC1CYP2D6CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 233 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4032349-A | STAIN FREE, COLOR SEPARATIONS | FUJI PHOTO FILM CO., LTD. (JA) | 1977-06-28 | — | — | US | claimed |
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12585188-B2 | Composition for forming resist underlying film | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4679175-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| US-20250377596-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-11 | — | — | US | disclosed |
| US-12493243-B2 | Film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-09 | — | — | US | disclosed |
| US-20250362609-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250355357-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-20 | — | — | US | disclosed |
| US-20250348001-A1 | METHOD FOR PRODUCING LAMINATE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-13 | — | — | US | disclosed |
| US-3999991-A | LIGHT SENSITIVE MATERIALS; SILVER HALIDE EMULSION LAYER | FUJI PHOTO FILM CO., LTD. (JA) | 1976-12-28 | — | — | US | disclosed |
| US-3994731-A | YELLOW, MAGENTA, AND CYAN DEVELOPERS | FUJI PHOTO FILM CO., LTD. (JA) | 1976-11-30 | — | — | US | disclosed |
| US-3993486-A | Diffusion transfer color photographic flim unit with composite of image-receiving element with light intercepting element | FUJI PHOTO FILM CO., LTD. (JA) | 1976-11-23 | — | — | US | disclosed |
| US-3993488-A | Photograhic film assembly comprising light intercepting elements located behind pressure plate | FUJI PHOTO FILM CO., LTD. (JA) | 1976-11-23 | — | — | US | disclosed |
| US-3986875-A | IMAGE-RECEIVING ELEMENT | FUJI PHOTO FILM CO., LTD. (JA) | 1976-10-19 | — | — | US | disclosed |
| US-3982946-A | Bis-azo pyrazolone type dye developer and light-sensitive material | FUJI PHOTO FILM CO., LTD. (JA) | 1976-09-28 | — | — | US | disclosed |
| US-3960558-A | Dye free, spectrally sensitive silver halide layers in diffusion transfer films | POLAROID CORPORATION (US) | 1976-06-01 | — | — | US | disclosed |
| US-3953211-A | COLOR PHOTOGRAPHY | FUJI PHOTO FILM CO., LTD. (JA) | 1976-04-27 | — | — | US | disclosed |
| US-3942987-A | Photographic materials with ballasted, alkali cleavable azo dyes | EASTMAN KODAK COMPANY | 1976-03-09 | — | — | US | disclosed |
| US-3930862-A | DYE DEVELOPER TRANSFER PHOTOSENSITIVE MATERIAL WITH SUBSTITUTED CATECHOL AUXILIARY DEVELOPER | FUJI PHOTO FILM CO., LTD. (JA) | 1976-01-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | CHKA 301/4885ACHE 2351/4885SMN1; SMN2 1964/4885 |
| US-12585188-B2 | Composition for forming resist underlying film | SRR, SMC1A, ASH2L | CHKA 1033/4885ACHE 3939/4885SMN1; SMN2 1669/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.