Potassium Ion

Potassium Ion

SCHEMBL5056227

[BH4-].[BH4-].[K+].[Na+]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA

The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Potassium Ion SCHEMBL5228448 0.87 — —
Potassium Ion SCHEMBL16653556 0.87 — —
Potassium Ion SCHEMBL48760 0.82 — —
SCHEMBL80 0.82 — —
SCHEMBL28743251 0.82 CA1 (0.33) —
SCHEMBL275668 0.82 — —
SCHEMBL5247960 0.82 — —
Potassium Ion SCHEMBL9450128 0.82 — —
SCHEMBL5398067 0.82 — —
SCHEMBL28767938 0.82 CA1 (0.33) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116267962-A Antibacterial spray of artemisinin derivative combined with nano metal solution and preparation method thereof 大连达伦特香氛科技有限公司 2023-06-23 — — CN claimed
CN-111175270-B Method for detecting trace arsenic in vegetable oil by extraction and dry ashing atomic fluorescence 道道全粮油股份有限公司 2022-03-11 — — CN claimed
CN-110176596-A A method of improving lithium battery anode coating material chemical property 启东启澳新材料科技发展有限公司 2019-08-27 — — CN claimed
US-9695159-B2 Process for preparation of canagliflozin GLENMARK PHARMACEUTICALS LIMITED (IN) 2017-07-04 — — US claimed
EP-2935092-A1 A HYDROGEN STORAGE PELLET Cella Acquisition Limited (GB) 2015-10-28 — — EP claimed
CN-104884382-A Hydrogen storage pellet CELLA ENERGY LTD 2015-09-02 — — CN claimed
US-20140178291-A1 HYDROGEN STORAGE PELLET CELLA ENERGY LIMITED (GB) 2014-06-26 — — US claimed
WO-2014096865-A1 A HYDROGEN STORAGE PELLET CELLA ENERGY LIMITED (GB) 2014-06-26 — — WO claimed
CN-101898993-A Preparation method of 4-hydroxyl ketopyrrolidine-2-acetamide YUAN DI 2010-12-01 — — CN claimed
US-7381844-B2 Hydrogenation process of chlorinated nitrobenzene NATIONAL CENTRAL UNIVERSITY (TW) 2008-06-03 — — US claimed
CN-110563787-B Preparation method of 5 alpha-androstane-17-hydroxy-3-ketone 华中药业股份有限公司 2024-12-03 — — CN disclosed
CN-116987110-B Refining process and system of high-performance organosilicon compound 全椒亚格泰电子新材料科技有限公司 2024-08-09 — — CN disclosed
CN-116987110-A Refining process and system of high-performance organosilicon compound 全椒亚格泰电子新材料科技有限公司 2023-11-03 — — CN disclosed
CN-116267962-A Antibacterial spray of artemisinin derivative combined with nano metal solution and preparation method thereof 大连达伦特香氛科技有限公司 2023-06-23 — — CN disclosed
CN-111036217-B Catalyst for preparing decanediol by continuous hydrogenation of dimethyl sebacate 中国石油化工股份有限公司 2023-04-07 — — CN disclosed
EP-0328944-B1 Conditioning a non-conductive substrate for subsequent selective deposition of a metal thereon IBM (US) 1994-08-31 — — EP disclosed
EP-0560795-A1 38-DECARBOXY-38-HYDROXYMETHYL DERIVATIVES OF TEICOPLANIN ANTIBIOTICS, AND A PROCESS FOR PREPARING THEM. LEPETIT SPA (IT) 1993-09-22 — — EP disclosed
WO-1992010516-A1 38-DECARBOXY-38-HYDROXYMETHYL DERIVATIVES OF TEICOPLANIN ANTIBIOTICS, AND A PROCESS FOR PREPARING THEM GRUPPO LEPETIT S.P.A. (IT) 1992-06-25 — — WO disclosed
US-4948707-A Conditioning a non-conductive substrate for subsequent selective deposition of a metal thereon INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1990-08-14 — — US disclosed
EP-0328944-A2 Conditioning a non-conductive substrate for subsequent selective deposition of a metal thereon International Business Machines Corporation (US) 1989-08-23 — — EP disclosed
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