SCHEMBL5110098

SCHEMBL5110098

C=C1OC(CC)(C23CC4CC(CC(C4)C2)C3)OC1=O

nearest known ligand 0.37

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 4/20 0.37
PRMT5 O14744 2/20 0.31
WDR77 Q9BQA1 2/20 0.31
CTSD P07339 1/20 0.31
BACE1 P56817 1/20 0.31
BACE2 Q9Y5Z0 1/20 0.31
ALDH1A1 P00352 1/20 0.31
HTT P42858 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5124668 0.76 HSD11B1 (0.32) HSD11B1PRMT5WDR77CTSDBACE1
SCHEMBL5110358 0.74 HSD11B1 (0.38) HSD11B1ALDH1A1
SCHEMBL5117595 0.73 MEN1 (0.35) HSD11B1ALDH1A1
SCHEMBL27622908 0.71 HSD11B1 (0.31) HSD11B1
SCHEMBL5117591 0.71 HSD11B1 (0.33) HSD11B1
SCHEMBL5116894 0.69 HSD11B1 (0.36) HSD11B1
SCHEMBL5117663 0.69 HSD11B1 (0.33) HSD11B1ALDH1A1
SCHEMBL5124539 0.68 HSD11B1 (0.38) HSD11B1
SCHEMBL5117899 0.68 EPHX2 (0.36) ALDH1A1
SCHEMBL26108610 0.68 PTPN1 (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1447403-B1 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS MITSUBISHI RAYON CO (JP) 2016-02-03 EP disclosed
US-7316884-B2 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI RAYON CO., LTD. (JP) 2008-01-08 US disclosed
US-20040248031-A1 5-Methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI CHEMICAL CORPORATION (JP) 2004-12-09 US disclosed
EP-1447403-A1 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS Mitsubishi Rayon Co., Ltd. (JP) 2004-08-18 EP disclosed
CN-1413992-A 5-methylene-1, 3-dioxolane-4-one inducer, heavy complex, chemical amplification type resist composition and method for forming the same MITSUBISHI RAYON CO (JP) 2003-04-30 CN disclosed