SCHEMBL5117899

SCHEMBL5117899

C=C1OC(C)(CCC23CC4CC(CC(C4)C2)C3)OC1=O

nearest known ligand 0.36

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 6/20 0.36
GRIN2D O15399 3/20 0.35
GRIN3B O60391 3/20 0.35
GRIN1 Q05586 3/20 0.35
GRIN2A Q12879 3/20 0.35
GRIN2B Q13224 3/20 0.35
GRIN2C Q14957 3/20 0.35
GRIN3A Q8TCU5 3/20 0.35
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
PKM P14618 1/20 0.35
HSD17B10 Q99714 1/20 0.32
CHRM2 P08172 1/20 0.31
CHRM1 P11229 1/20 0.31
CHRM3 P20309 1/20 0.31
CA9 Q16790 1/20 0.30
ALDH1A1 P00352 1/20 0.30
P2RX7 Q99572 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5117663 0.86 HSD11B1 (0.33) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL5117595 0.80 MEN1 (0.35) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL5123876 0.76 HSD11B1 (0.31)
SCHEMBL5110358 0.72 HSD11B1 (0.38) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL5118672 0.72 HSD11B1 (0.32)
SCHEMBL5124668 0.70 HSD11B1 (0.32)
SCHEMBL5110098 0.68 HSD11B1 (0.37) ALDH1A1
SCHEMBL11697939 0.66 GRIN2D (0.68) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL5117895 0.66 SLC22A2 (0.35) EPHX2ALDH1A1P2RX7
SCHEMBL5117591 0.63 HSD11B1 (0.33) EPHX2MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1447403-B1 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS MITSUBISHI RAYON CO (JP) 2016-02-03 EP disclosed
US-7316884-B2 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI RAYON CO., LTD. (JP) 2008-01-08 US disclosed
US-20040248031-A1 5-Methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI CHEMICAL CORPORATION (JP) 2004-12-09 US disclosed
EP-1447403-A1 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS Mitsubishi Rayon Co., Ltd. (JP) 2004-08-18 EP disclosed