Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 2/20 | 0.33 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.33 |
| ▸ | SLC47A1 | Q96FL8 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5117895 | 0.78 | SLC22A2 (0.35) | HSD11B1SLC22A2SLC47A1MAPTEPHX2 | |
| SCHEMBL5110098 | 0.71 | HSD11B1 (0.37) | HSD11B1 | |
| SCHEMBL5110358 | 0.69 | HSD11B1 (0.38) | HSD11B1KMT2AMEN1EPHX2 | |
| SCHEMBL5117595 | 0.68 | MEN1 (0.35) | HSD11B1MAPTKMT2AMEN1EPHX2 | |
| SCHEMBL5124668 | 0.64 | HSD11B1 (0.32) | HSD11B1 | |
| SCHEMBL5116894 | 0.64 | HSD11B1 (0.36) | HSD11B1 | |
| SCHEMBL5117663 | 0.64 | HSD11B1 (0.33) | HSD11B1EPHX2 | |
| SCHEMBL677940 | 0.63 | SLC22A2 (0.62) | SLC22A2SLC47A1MAPTKMT2AMEN1 | |
| SCHEMBL5124539 | 0.63 | HSD11B1 (0.38) | HSD11B1 | |
| SCHEMBL5117899 | 0.63 | EPHX2 (0.36) | KMT2AMEN1EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1447403-B1 | 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS | MITSUBISHI RAYON CO (JP) | 2016-02-03 | — | — | EP | disclosed |
| US-7316884-B2 | 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process | MITSUBISHI RAYON CO., LTD. (JP) | 2008-01-08 | — | — | US | disclosed |
| US-20040248031-A1 | 5-Methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-12-09 | — | — | US | disclosed |
| EP-1447403-A1 | 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS | Mitsubishi Rayon Co., Ltd. (JP) | 2004-08-18 | — | — | EP | disclosed |