SCHEMBL5117595

SCHEMBL5117595

C=C1OC(CC)(CCC23CC4CC(CC(C4)C2)C3)OC1=O

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.35
KMT2A Q03164 4/20 0.35
EPHX2 P34913 4/20 0.35
HSD11B1 P28845 2/20 0.35
GRIN2D O15399 4/20 0.34
GRIN3B O60391 4/20 0.34
GRIN1 Q05586 4/20 0.34
GRIN2A Q12879 4/20 0.34
GRIN2B Q13224 4/20 0.34
GRIN2C Q14957 4/20 0.34
GRIN3A Q8TCU5 4/20 0.34
PKM P14618 1/20 0.34
ALDH1A1 P00352 1/20 0.32
MAPT P10636 1/20 0.32
ATM Q13315 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
HSD17B10 Q99714 1/20 0.31
CHRM2 P08172 1/20 0.30
CHRM1 P11229 1/20 0.30
CHRM3 P20309 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5110358 0.86 HSD11B1 (0.38) MEN1KMT2AEPHX2HSD11B1GRIN2D
SCHEMBL5117899 0.80 EPHX2 (0.36) MEN1KMT2AEPHX2GRIN2DGRIN3B
SCHEMBL5124553 0.78 HSD11B1 (0.35) HSD11B1
SCHEMBL26108610 0.76 PTPN1 (0.42)
SCHEMBL5116894 0.75 HSD11B1 (0.36) HSD11B1
SCHEMBL5110098 0.73 HSD11B1 (0.37) HSD11B1ALDH1A1
SCHEMBL5117663 0.72 HSD11B1 (0.33) EPHX2HSD11B1GRIN2DGRIN3BGRIN1
SCHEMBL5117591 0.68 HSD11B1 (0.33) MEN1KMT2AEPHX2HSD11B1MAPT
SCHEMBL5124668 0.66 HSD11B1 (0.32) HSD11B1
SCHEMBL11697939 0.65 GRIN2D (0.68) MEN1KMT2AEPHX2GRIN2DGRIN3B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1447403-B1 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS MITSUBISHI RAYON CO (JP) 2016-02-03 EP disclosed
US-7316884-B2 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI RAYON CO., LTD. (JP) 2008-01-08 US disclosed
US-20040248031-A1 5-Methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI CHEMICAL CORPORATION (JP) 2004-12-09 US disclosed
EP-1447403-A1 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS Mitsubishi Rayon Co., Ltd. (JP) 2004-08-18 EP disclosed