Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 18/20 | 0.39 |
| ▸ | CA1 | P00915 | 17/20 | 0.39 |
| ▸ | MMP1 | P03956 | 3/20 | 0.38 |
| ▸ | MMP2 | P08253 | 3/20 | 0.38 |
| ▸ | MMP9 | P14780 | 3/20 | 0.38 |
| ▸ | MMP8 | P22894 | 3/20 | 0.38 |
| ▸ | MMP13 | P45452 | 3/20 | 0.38 |
| ▸ | GPR3 | P46089 | 1/20 | 0.34 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4535202 | 1.00 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL5567499 | 1.00 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL60437 | 1.00 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| Perflubutane SCHEMBL6325042 | 1.00 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL546546 | 1.00 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL51399 | 0.98 | CA2 (0.38) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL1482705 | 0.98 | CA2 (0.38) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL6117378 | 0.97 | CA2 (0.37) | CA2CA1MMP1MMP2MMP9 | |
| Trifluoromethanesulfonic Acid SCHEMBL3413696 | 0.95 | GPR3 (0.40) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL7569683 | 0.94 | CA1 (0.35) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1503 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| US-20250377591-A1 | PHOTORESIST COMPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO LTD (KR) | 2025-12-11 | — | — | US | claimed |
| CN-119463004-B | 3, 4-Dihydroxystyrene polymer, preparation thereof and photoresist composition | 微芯新材料(湖州)有限公司 | 2025-06-10 | — | — | CN | claimed |
| CN-119923600-A | Chemically amplified positive resist composition for improving pattern profile and enhancing adhesion | YC化学制品株式会社 | 2025-05-02 | — | — | CN | claimed |
| CN-119463075-A | Poly (4-hydroxystyrene) -based block copolymer and preparation and application thereof | 微芯新材料(湖州)有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-119463004-A | 3, 4-Dihydroxystyrene polymer, preparation thereof and photoresist composition | 微芯新材料(湖州)有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-118818901-A | KrF negative photoresist and preparation method and patterning forming method thereof | 厦门恒坤新材料科技股份有限公司 | 2024-10-22 | — | — | CN | claimed |
| US-11906900-B2 | Chemically amplified positive photoresist composition for improving pattern profile | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2024-02-20 | — | — | US | claimed |
| US-11586109-B2 | Chemically-amplified-type negative-type photoresist composition | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2023-02-21 | — | — | US | claimed |
| CN-115685678-A | Star-shaped molecular glass film forming resin and photoresist and preparation method thereof | 南通林格橡塑制品有限公司 | 2023-02-03 | — | — | CN | claimed |
| US-6627382-B2 | Includes perfluoro-2,2-dimethy-1,3-dioxole derivatives and vinyl derivatives; for F2 excimer laser | SAMSUNG ELECTRONICS, CO., LTD. (KR) | 2003-09-30 | — | — | US | claimed |
| US-20030157430-A1 | Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-08-21 | — | — | US | claimed |
| US-6596459-B1 | Photosensitive polymer having a main chain consisting of only norbornene-type alicyclic units | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-07-22 | — | — | US | claimed |
| US-6537727-B2 | Improved dry etching resistance, adhesiveness to underlying material layers, line edge roughness of line patterns, contrast characteristics | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-03-25 | — | — | US | claimed |
| US-20020177067-A1 | Fluoro-containing photosensitive polymer and photoresist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. | 2002-11-28 | — | — | US | claimed |
| US-20020160303-A1 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-31 | — | — | US | claimed |
| US-20020155379-A1 | Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-24 | — | — | US | claimed |
| US-20020042016-A1 | Resist composition comprising photosensitive polymer having loctone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-04-11 | — | — | US | claimed |
| US-20010024763-A1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-09-27 | — | — | US | claimed |
| US-6033826-A | POLYHYDROXYSTYRENE DERIVATIVE CONTAINING AN ACETAL OR KETAL GROUP WHICH CAN EASILY BE ELIMINATED IN THE PRESENCE OF AN ACID IN THE MOLECULE AND HAVING A VERY NARROW MOLECULAR WEIGHT DISTRIBUTION GIVES A RESIST MATERIAL | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2000-03-07 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020160303-A1 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | PAH, SUV39H1, SUV39H2 | CA2 4086/4885CA1 4774/4885MMP1 4854/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.