SCHEMBL5147516

SCHEMBL5147516

CC(c1ccccc1)C(OB(OC(c1ccccc1)(c1ccccc1)C(C)c1ccccc1)OC(c1ccccc1)(c1ccccc1)C(C)c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 3/20 0.36
MAPK1 P28482 1/20 0.34
ALDH1A1 P00352 2/20 0.32
RIPK1 Q13546 1/20 0.32
ALOX15 P16050 1/20 0.32
CYP2D6 P10635 2/20 0.32
CYP1A2 P05177 1/20 0.32
ADRA2A P08913 1/20 0.31
ADRA2C P18825 1/20 0.31
LMNA P02545 1/20 0.31
HIF1A Q16665 1/20 0.31
KDM4E B2RXH2 1/20 0.31
KIF11 P52732 2/20 0.31
CACNA1F O60840 1/20 0.31
CHRM2 P08172 1/20 0.31
CHRM1 P11229 1/20 0.31
ADRA2B P18089 1/20 0.31
CHRM3 P20309 1/20 0.31
ADRA1A P35348 1/20 0.31
HRH1 P35367 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5147521 0.85 CYP1A2 (0.37) MAPK1ALDH1A1ALOX15CYP2D6CYP1A2
SCHEMBL4459726 0.78 MAPK1 (0.35) TAAR1MAPK1ALDH1A1RIPK1ALOX15
SCHEMBL703112 0.78 MAPK1 (0.35) TAAR1MAPK1ALDH1A1RIPK1ALOX15
SCHEMBL4459729 0.76 ALDH1A1 (0.35) MAPK1ALDH1A1ALOX15CYP2D6CYP1A2
SCHEMBL6741619 0.72 TAAR1 (0.41) TAAR1MAPK1ALDH1A1RIPK1CYP2D6
SCHEMBL7666676 0.72 CTSK (0.37) ALDH1A1KDM4EHRH1
SCHEMBL28972220 0.72 SRC (0.40)
SCHEMBL8016468 0.71 MEN1 (0.37) OPRK1
SCHEMBL8714854 0.70 MMP8 (0.33) CYP1A2LMNAKCNN4
SCHEMBL3482030 0.69 KEAP1 (0.37) MAPK1ALDH1A1LMNAKDM4EKIF11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117597368-A Curable composition and cured product 迪睿合株式会社 2024-02-23 CN disclosed
CN-113166415-A Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method 三菱瓦斯化学株式会社 2021-07-23 CN disclosed
CN-113039177-A Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method 三菱瓦斯化学株式会社 2021-06-25 CN disclosed
CN-112996839-A Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method 三菱瓦斯化学株式会社 2021-06-18 CN disclosed
US-7220529-B2 Photopolymerizable composition and recording material using the same FUJIFILM CORPORATION (JP) 2007-05-22 US disclosed
US-20050186504-A1 Photopolymerizable composition and recording material using the same FUJI PHOTO FILM CO., LTD. 2005-08-25 US disclosed
US-6919159-B2 Photopolymerizable composition and recording material using the same FUJI PHOTO FILM CO., LTD. (JP) 2005-07-19 US disclosed
US-6830861-B2 Photosensitivity; sharp images; high contrast FUJI PHOTO FILM CO., LTD. (JP) 2004-12-14 US disclosed
US-6824953-B2 POLYMERIZABLE COMPOUND HAVING AN ETHYLENIC UNSATURATED BOND, A METHINE DYE, AND A RADICAL GENERATOR THAT INTERACTS WITH THE DYE TO GENERATE A RADICAL FUJI PHOTO FILM CO., LTD. (JP) 2004-11-30 US disclosed
US-6740466-B1 HIGH SENSITIVITY TO UV, VISIBLE, ANDINFRARED; FOGGING OF THE BACKGROUND IS REDUCED; CLARITY AND HIGH CONTRAST; ADDITION POLYMERIZABLE COMPOUND, AN INDOLE-PYRIMIDINETRIONE METHINE DYE, AN ANIONIC ORGANOBORON COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 2004-05-25 US disclosed
US-6713523-B2 DECOLORING DYES FUJI PHOTO FILM CO., LTD. (JP) 2004-03-30 US disclosed
US-6686105-B2 TWO OR MORE COLOR-DEVELOPING LAYERS, WHICH DEVELOP HUES DIFFERING FROM EACH OTHER, LAMINATED ON THE SUPPORT. FUJI PHOTO FILM CO., LTD. (JP) 2004-02-03 US disclosed
US-20030129523-A1 Photopolymerizable composition and recording material using the same FUJIFILM CORPORATION (JP) 2003-07-10 US disclosed
US-20020182530-A1 Polymerizable compound having an ethylenic unsaturated bond, a methine dye, and a radical generator that interacts with the dye to generate a radical FUJI PHOTO FILM CO., LTD. 2002-12-05 US disclosed
US-20020168494-A1 Photopolymerizable composition and photosensitive thermal recording material FUJI PHOTO FILM CO., LTD. 2002-11-14 US disclosed
US-20020142244-A1 Photopolymerizable composition and recording material FUJI PHOTO FILM CO., LTD. 2002-10-03 US disclosed
US-20020102480-A1 Color filter, color filter forming material and process for producing color filter FUJI PHOTO FILM CO., LTD. 2002-08-01 US disclosed
US-20020051926-A1 Cyanine-based organic dyes, photopolymerizable compositions, and recording materials FUJI PHOTO FILM CO., LTD. (JP) 2002-05-02 US disclosed
US-6022664-A MIXTURE OF A POLYMERIZABLE VINYL MONOMER AND ORGANIC BORATE COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 2000-02-08 US disclosed
EP-0453317-A2 Image forming medium CANON KABUSHIKI KAISHA (JP) 1991-10-23 EP disclosed