Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29028773 | 0.97 | CYP1A2 (0.41) | — | |
| SCHEMBL5242776 | 0.97 | — | — | |
| SCHEMBL2442076 | 0.97 | — | — | |
| SCHEMBL223265 | 0.97 | — | — | |
| SCHEMBL8242234 | 0.94 | CYP1A2 (0.45) | — | |
| SCHEMBL17297103 | 0.94 | — | — | |
| Hydrochloric Acid SCHEMBL9035401 | 0.94 | CYP1A2 (0.40) | — | |
| Ammonia Solution, Strong SCHEMBL3635864 | 0.94 | — | — | |
| SCHEMBL21960718 | 0.94 | CYP1A2 (0.45) | — | |
| SCHEMBL18116437 | 0.94 | CYP1A2 (0.45) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11992827-B2 | MSECT-4 molecular sieves with off and ERI topologies, preparation method therefor, and applications thereof | CHINA AUTOMOTIVE TECHNOLOGY AND RESEARCH CENTER CO., LTD (CN) | 2024-05-28 | — | — | US | claimed |
| CN-114790007-B | SSZ-39 molecular sieve, preparation method thereof and DeNOx reaction catalyst | 中化学科学技术研究有限公司 | 2024-05-10 | — | — | CN | claimed |
| CN-117735568-A | SSZ-39 molecular sieve and preparation method and application thereof | 中化学科学技术研究有限公司 | 2024-03-22 | — | — | CN | claimed |
| US-20230330649-A1 | MSECT-4 MOLECULAR SIEVES WITH OFF AND ERI TOPOLOGIES, PREPARATION METHOD THEREFOR, AND APPLICATIONS THEREOF | CHINA AUTOMOTIVE TECHNOLOGY AND RESEARCH CENTER CO., LTD (CN) | 2023-10-19 | — | — | US | claimed |
| CN-116835607-A | SSZ-39 molecular sieve, preparation method thereof and DeNOx reaction catalyst | 中化学科学技术研究有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116282067-A | SSZ-39 molecular sieve, preparation method thereof and DeNOx reaction catalyst | 中化学科学技术研究有限公司 | 2023-06-23 | — | — | CN | claimed |
| CN-115260041-A | Novel anti-aging agent and preparation method thereof | 王兴路 | 2022-11-01 | — | — | CN | claimed |
| CN-114455604-B | OFF + ERI structure msect-4 molecular sieve, preparation method and application thereof | 中汽研（天津）汽车工程研究院有限公司 | 2022-07-01 | — | — | CN | claimed |
| CN-114455604-A | OFF + ERI structure msect-4 molecular sieve, preparation method and application thereof | 中汽研（天津）汽车工程研究院有限公司 | 2022-05-10 | — | — | CN | claimed |
| CN-111036296-A | Supported condensation catalyst, preparation method thereof and application of supported condensation catalyst in synthesis of 1, 3-butanediol | 万华化学集团股份有限公司 | 2020-04-21 | — | — | CN | claimed |
| US-11992827-B2 | MSECT-4 molecular sieves with off and ERI topologies, preparation method therefor, and applications thereof | CHINA AUTOMOTIVE TECHNOLOGY AND RESEARCH CENTER CO., LTD (CN) | 2024-05-28 | — | — | US | disclosed |
| CN-114790007-B | SSZ-39 molecular sieve, preparation method thereof and DeNOx reaction catalyst | 中化学科学技术研究有限公司 | 2024-05-10 | — | — | CN | disclosed |
| CN-117735568-A | SSZ-39 molecular sieve and preparation method and application thereof | 中化学科学技术研究有限公司 | 2024-03-22 | — | — | CN | disclosed |
| CN-111867976-B | CHA zeolitic materials and related methods of synthesis | 巴斯夫公司 | 2024-03-22 | — | — | CN | disclosed |
| CN-117602640-A | Mesoporous SSZ-39 molecular sieve, preparation method thereof and DeNO x Reaction catalyst | 中化学科学技术研究有限公司 | 2024-02-27 | — | — | CN | disclosed |
| CN-111036296-A | Supported condensation catalyst, preparation method thereof and application of supported condensation catalyst in synthesis of 1, 3-butanediol | 万华化学集团股份有限公司 | 2020-04-21 | — | — | CN | disclosed |
| EP-1570512-A4 | SLURRY COMPOSITION FOR SECONDARY POLISHING OF SILICON WAFER | CHEIL IND INC (KR) | 2007-05-09 | — | — | EP | disclosed |
| EP-1570512-A1 | SLURRY COMPOSITION FOR SECONDARY POLISHING OF SILICON WAFER | Cheil Industries Inc. (KR) | 2005-09-07 | — | — | EP | disclosed |
| WO-2004053968-A1 | SLURRY COMPOSITION FOR SECONDARY POLISHING OF SILICON WAFER | CHEIL INDUSTRIES INC. (KR) | 2004-06-24 | — | — | WO | disclosed |
| US-5139571-A | Non-contaminating wafer polishing slurry | MOTOROLA, INC. (US) | 1992-08-18 | — | — | US | disclosed |