Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | GAA | P10253 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | RBP4 | P02753 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | XBP1 | P17861 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14670207 | 0.85 | PKM (0.44) | PKML3MBTL1ALDH1A1GAAKMT2A | |
| SCHEMBL3953932 | 0.81 | PKM (0.41) | PKML3MBTL1ALDH1A1GAAKMT2A | |
| SCHEMBL769274 | 0.80 | NPSR1 (0.31) | ALDH1A1KMT2AMEN1NPSR1 | |
| SCHEMBL5195169 | 0.79 | CYP17A1 (0.39) | ALDH1A1GAAKMT2AMEN1NPSR1 | |
| SCHEMBL7748923 | 0.77 | ALDH1A1 (0.47) | PKML3MBTL1ALDH1A1GAAKMT2A | |
| Acrylic Acid SCHEMBL29281850 | 0.77 | PKM (0.49) | PKML3MBTL1ALDH1A1GAAKMT2A | |
| SCHEMBL14594000 | 0.76 | PKM (0.38) | PKML3MBTL1ALDH1A1GAAKMT2A | |
| SCHEMBL13589980 | 0.75 | L3MBTL1 (0.58) | PKML3MBTL1ALDH1A1GAAKMT2A | |
| SCHEMBL164232 | 0.75 | L3MBTL1 (0.58) | PKML3MBTL1ALDH1A1GAAKMT2A | |
| SCHEMBL14493665 | 0.75 | L3MBTL1 (0.58) | PKML3MBTL1ALDH1A1GAAKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3486067-B1 | METHOD FOR PRODUCING ANTIFOULING FILM | SHARP KK (JP) | 2022-09-28 | — | — | EP | disclosed |
| CN-109475901-B | Method for producing antifouling film | 夏普株式会社 | 2021-12-14 | — | — | CN | disclosed |
| US-11142653-B2 | Method for producing antifouling film | SHARP KABUSHIKI KAISHA (JP) | 2021-10-12 | — | — | US | disclosed |
| US-11142617-B2 | Method for producing antifouling film | SHARP KABUSHIKI KAISHA (JP) | 2021-10-12 | — | — | US | disclosed |
| EP-3485986-B1 | METHOD FOR PRODUCING ANTIFOULING FILM | SHARP KK (JP) | 2020-05-20 | — | — | EP | disclosed |
| US-20190300666-A1 | METHOD FOR PRODUCING ANTIFOULING FILM | SHARP KABUSHIKI KAISHA (JP) | 2019-10-03 | — | — | US | disclosed |
| US-20190233656-A1 | METHOD FOR PRODUCING ANTIFOULING FILM | DAIKIN INDUSTRIES, LTD. (JP) | 2019-08-01 | — | — | US | disclosed |
| EP-3485986-A1 | METHOD FOR PRODUCING ANTIFOULING FILM | Sharp Kabushiki Kaisha (JP) | 2019-05-22 | — | — | EP | disclosed |
| EP-3486067-A1 | METHOD FOR PRODUCING ANTIFOULING FILM | Sharp Kabushiki Kaisha (JP) | 2019-05-22 | — | — | EP | disclosed |
| US-20180065924-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-03-08 | — | — | US | disclosed |
| US-9522998-B2 | Resin mold material composition for imprinting | DAIKIN INDUSTRIES, LTD. (JP) | 2016-12-20 | — | — | US | disclosed |
| US-20150064909-A1 | RESIN MOLD MATERIAL COMPOSITION FOR IMPRINTING | DAIKIN INDUSTRIES, LTD. (JP) | 2015-03-05 | — | — | US | disclosed |
| US-7271297-B2 | Process for producing vinyl ether compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2007-09-18 | — | — | US | disclosed |
| EP-1826196-A2 | Vinyl ether compounds | Daicel Chemical Industries, Ltd. (JP) | 2007-08-29 | — | — | EP | disclosed |
| US-20060205957-A1 | Process for producing vinyl ether compounds | ISHII YASUTAKA | 2006-09-14 | — | — | US | disclosed |
| US-7074970-B2 | Process for producing vinyl ether compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-07-11 | — | — | US | disclosed |
| US-20060058480-A1 | Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-03-16 | — | — | US | disclosed |
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-12-22 | — | — | US | disclosed |
| US-20030083529-A1 | Process for producing vinyl ether compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-05-01 | — | — | US | disclosed |
| EP-1288186-A2 | Vinyl ether compounds and preparation process thereof | Daicel Chemical Industries, Ltd. (JP) | 2003-03-05 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060205957-A1 | Process for producing vinyl ether compounds | ETV6, CYP3A4, SUV39H2 | PKM 1297/4885L3MBTL1 1759/4885ALDH1A1 1064/4885 |
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | AFF1, AFF2, FPR1 | PKM 4371/4885L3MBTL1 608/4885ALDH1A1 512/4885 |
| US-20030083529-A1 | Process for producing vinyl ether compounds | SRD5A2, RPS4X, RUVBL2 | PKM 1756/4885L3MBTL1 2081/4885ALDH1A1 673/4885 |
| US-20180065924-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | C1R, RER1, C1S | PKM 3345/4885L3MBTL1 2277/4885ALDH1A1 2788/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.