Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 | Q99720 | 5/20 | 0.48 |
| ▸ | MAOA | P21397 | 1/20 | 0.48 |
| ▸ | MAOB | P27338 | 2/20 | 0.46 |
| ▸ | HTR2A | P28223 | 1/20 | 0.46 |
| ▸ | IDO1 | P14902 | 1/20 | 0.45 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.45 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.45 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.45 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.45 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.45 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.45 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.45 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.45 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.45 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.45 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.45 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL707928 | 0.93 | MAOA (0.52) | SIGMAR1MAOAMAOBHTR2AL3MBTL1 | |
| SCHEMBL1204280 | 0.91 | SIGMAR1 (0.52) | SIGMAR1MAOAMAOBL3MBTL1 | |
| SCHEMBL20483304 | 0.91 | SIGMAR1 (0.52) | SIGMAR1MAOAMAOBL3MBTL1 | |
| SCHEMBL19470836 | 0.91 | SIGMAR1 (0.52) | SIGMAR1MAOAMAOBL3MBTL1 | |
| SCHEMBL19470869 | 0.91 | SIGMAR1 (0.52) | SIGMAR1MAOAMAOBL3MBTL1 | |
| SCHEMBL19470860 | 0.91 | SIGMAR1 (0.52) | SIGMAR1MAOAMAOBL3MBTL1 | |
| SCHEMBL19470855 | 0.91 | SIGMAR1 (0.52) | SIGMAR1MAOAMAOBL3MBTL1 | |
| SCHEMBL20483345 | 0.91 | SIGMAR1 (0.52) | SIGMAR1MAOAMAOBL3MBTL1 | |
| SCHEMBL19470817 | 0.91 | SIGMAR1 (0.52) | SIGMAR1MAOAMAOBL3MBTL1 | |
| SCHEMBL297259 | 0.85 | ALDH1A1 (0.48) | SIGMAR1MAOAMAOBHTR2AIDO1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 197 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2014170799-A1 | CROSSLINKABLE VARNISH AND METHOD FOR APPLYING SAME | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) | 2014-10-23 | — | — | WO | claimed |
| US-20130153263-A1 | INORGANIC NANOFILLER, PARTIAL DISCHARGE RESISTANT ENAMELED WIRE INCLUDING THE SAME, AND PREPARING METHOD OF THE ENAMELED WIRE | SEJONG UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION (KR) | 2013-06-20 | — | — | US | claimed |
| US-7704432-B2 | Imprint lithographic method for making a polymeric structure | AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) | 2010-04-27 | — | — | US | claimed |
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12585188-B2 | Composition for forming resist underlying film | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| US-20250377596-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-11 | — | — | US | disclosed |
| US-20250355357-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-20 | — | — | US | disclosed |
| US-20250348001-A1 | METHOD FOR PRODUCING LAMINATE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-13 | — | — | US | disclosed |
| US-12339586-B2 | Photocurable resin composition containing self-crosslinkable polymer | NISSAN CHEMICAL CORPORATION (JP) | 2025-06-24 | — | — | US | disclosed |
| US-20250172869-A1 | WAFER END PROTECTIVE-FILM FORMING COMPOSITION FOR SEMICONDUCTOR MANUFACTURING | NISSAN CHEMICAL CORPORATION (JP) | 2025-05-29 | — | — | US | disclosed |
| US-5869724-A | REAGENTS FOR MODIFYING THE SURFACE OF LIQUID CHROMATOGRAPHY SUPPORTS | HEWLETT-PACKARD COMPANY (US) | 1999-02-09 | — | — | US | disclosed |
| EP-0617073-B1 | Poly(silyleneethynylene phenyleneethynylenes), method for preparing same and hardened product thereof | MITSUI CHEMICALS INC (JP) | 1998-12-09 | — | — | EP | disclosed |
| US-5420238-A | Heat resistant | MITSUI TOATSU CHEMICALS, INC. (JP) | 1995-05-30 | — | — | US | disclosed |
| EP-0617073-A2 | Poly(silyleneethynylene phenyleneethynylenes), method for preparing same and hardened product thereof | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1994-09-28 | — | — | EP | disclosed |
| EP-0154519-B1 | PHOTOACTIVATED POLYMERIZATION OF VINYL MONOMER IN THE PRESENCE OF POLYSILANES AND AMINES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1988-08-03 | — | — | EP | disclosed |
| US-4569953-A | Photoactivated polymerization of vinyl monomers by polysilanes | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1986-02-11 | — | — | US | disclosed |
| US-4548690-A | HIGH SPEED CURING IN THE PRESENCE OF OXYGEN PROTECTIVE COATINGS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1985-10-22 | — | — | US | disclosed |
| EP-0154519-A2 | Photoactivated polymerization of vinyl monomer in the presence of polysilanes and amines | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1985-09-11 | — | — | EP | disclosed |
| US-4417069-A | FROM STYRENE AND CHLOROSILANE, PLATINUM CATALYST AND TERTIARY AMINE | GENERAL ELECTRIC COMPANY (US) | 1983-11-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | SIGMAR1 1321/4885MAOA 2652/4885MAOB 3748/4885 |
| US-12585188-B2 | Composition for forming resist underlying film | SRR, SMC1A, ASH2L | SIGMAR1 467/4885MAOA 2131/4885MAOB 1541/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.