SCHEMBL5352715

SCHEMBL5352715

C=Cc1ccc(OC(C)Cc2ccccc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
PPARG P37231 13/20 0.47
PPARA Q07869 13/20 0.47
IGLV6-57 P01721 1/20 0.43
LTA4H P09960 1/20 0.42
ALDH1A1 P00352 1/20 0.42
TSHR P16473 1/20 0.42
TAAR1 Q96RJ0 2/20 0.40
MAOA P21397 1/20 0.40
SLC6A2 P23975 1/20 0.40
SLC6A4 P31645 1/20 0.40
SLC6A3 Q01959 1/20 0.40
SIGMAR1 Q99720 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28735087 0.82 SIGMAR1 (0.52) PPARGPPARAIGLV6-57LTA4HTAAR1
SCHEMBL7209894 0.81 PPARA (0.43) PPARGPPARAALDH1A1TSHR
SCHEMBL2973189 0.80 LCK (0.39) PPARGPPARAALDH1A1TSHR
SCHEMBL7920138 0.79 CHRNB2 (0.45) LTA4HALDH1A1TSHR
SCHEMBL3695401 0.79 ALDH1A1 (0.48) ALDH1A1TSHR
SCHEMBL10204601 0.77 ALDH1A1 (0.41) ALDH1A1
SCHEMBL685739 0.77 PPARG (0.38) PPARGPPARAALDH1A1TSHR
SCHEMBL6780367 0.77 NR1H4 (0.39) PPARGPPARAALDH1A1TSHR
SCHEMBL5197835 0.77 ALDH1A1 (0.44) ALDH1A1TSHRTAAR1MAOASLC6A2
SCHEMBL3032255 0.76 TAS1R3 (0.43) ALDH1A1TSHRSIGMAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed