SCHEMBL5353973

SCHEMBL5353973

O=C(Nc1ccccc1)N(S)c1ccccc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.56
KMT2A Q03164 2/20 0.56
HSD17B10 Q99714 3/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
ALDH1A1 P00352 2/20 0.50
TP53 P04637 1/20 0.50
EPHX1 P07099 1/20 0.50
TSHR P16473 1/20 0.50
EPHX2 P34913 1/20 0.50
CDK9 P50750 1/20 0.50
CLK4 Q9HAZ1 1/20 0.50
NPSR1 Q6W5P4 1/20 0.50
NPC1 O15118 1/20 0.50
MAPT P10636 1/20 0.50
ALOX15 P16050 1/20 0.50
RAB9A P51151 1/20 0.50
USP2 O75604 1/20 0.49
NAPRT Q6XQN6 1/20 0.47
MTOR P42345 1/20 0.46
CASP3 P42574 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9243026 0.89 CASP3 (0.56) MEN1KMT2AHSD17B10SMN1; SMN2ALDH1A1
SCHEMBL5981553 0.88 MAPT (0.53) MEN1KMT2AHSD17B10SMN1; SMN2ALDH1A1
SCHEMBL6819624 0.86 NAPRT (0.61) MEN1KMT2AHSD17B10SMN1; SMN2ALDH1A1
SCHEMBL6815733 0.85 PLAU (0.48) MEN1KMT2AHSD17B10SMN1; SMN2ALDH1A1
SCHEMBL4341297 0.81 KMT2A (0.43) MEN1KMT2AHSD17B10SMN1; SMN2ALDH1A1
SCHEMBL9785823 0.81 NPC1 (0.42) MEN1KMT2AHSD17B10SMN1; SMN2ALDH1A1
SCHEMBL4351896 0.80 MAPT (0.48) MEN1KMT2AHSD17B10SMN1; SMN2ALDH1A1
SCHEMBL4355356 0.80 HSPD1 (0.49) MEN1KMT2AHSD17B10SMN1; SMN2ALDH1A1
SCHEMBL10791571 0.79 MEN1 (0.59) MEN1KMT2AHSD17B10SMN1; SMN2ALDH1A1
SCHEMBL30879612 0.79 MEN1 (0.59) MEN1KMT2AHSD17B10SMN1; SMN2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1062283-B1 LATENT COATING FOR METAL SURFACE REPAIR MINNESOTA MINING & MFG (US) 2003-08-27 EP claimed
EP-0569038-B1 A reversible electrode MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 1996-01-03 EP claimed
US-5370947-A Comprising thiourea compounds or polythioureas; oxidation-reduction of sulfur atoms; lightweight batteries MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1994-12-06 US claimed
EP-0569038-A1 A reversible electrode MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1993-11-10 EP claimed
CN-112512770-B Vulcanization compositions for reducing allergenic potential and elastomeric articles formed therefrom 阿利吉安斯公司 2023-02-21 CN disclosed
CN-115651271-A Vulcanization compositions for reducing allergen potential and elastomeric articles formed therefrom 阿利吉安斯公司 2023-01-31 CN disclosed
CN-112512770-A Vulcanization compositions for reducing allergenic potential and elastomeric articles formed therefrom 阿利吉安斯公司 2021-03-16 CN disclosed
US-10253256-B2 Use of sulfur and selenium compounds as precursors to nanostructured materials THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK (US) 2019-04-09 US disclosed
US-20160237345-A1 USE OF SULFUR AND SELENIUM COMPOUNDS AS PRECURSORS TO NANOSTRUCTURED MATERIALS THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK (US) 2016-08-18 US disclosed
EP-3049370-A1 USE OF SULFUR AND SELENIUM COMPOUNDS AS PRECURSORS TO NANOSTRUCTURED MATERIALS The Trustees of Columbia University in the City of New York (US) 2016-08-03 EP disclosed
US-7273540-B2 Tin-silver-copper plating solution, plating film containing the same, and method for forming the plating film SHINRYO ELECTRONICS CO., LTD. (JP) 2007-09-25 US disclosed
US-20050184369-A1 Tin-silver-copper plating solution, plating film containing the same, and method for forming the plating film SINRYO ELECTRONICS CO., LTD. (JP) 2005-08-25 US disclosed
EP-0789266-A1 Silver halide photographic light sentitive material KONICA CORPORATION (JP) 1997-08-13 EP disclosed
EP-0569038-B1 A reversible electrode MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 1996-01-03 EP disclosed
US-5370947-A Comprising thiourea compounds or polythioureas; oxidation-reduction of sulfur atoms; lightweight batteries MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1994-12-06 US disclosed
EP-0569038-A1 A reversible electrode MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1993-11-10 EP disclosed
EP-0534735-A1 Lubricating oil composition MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1993-03-31 EP disclosed
EP-0254010-A2 Methods for production of crosslinked rubber products SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1988-01-27 EP disclosed
EP-0172961-A1 1-Butene polymer and its use MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1986-03-05 EP disclosed
US-4252705-A USEFUL FOR REMOVAL OF VINYL CHLORIDE FROM POLYVINYL CHLORIDE BY HEATING ARGUS CHEMICAL CORPORATION (US) 1981-02-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10253256-B2 Use of sulfur and selenium compounds as precursors to nanostructured materials SCLY, TST, SOD1 MEN1 817/4885KMT2A 4073/4885HSD17B10 3312/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.