Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.55 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.54 |
| ▸ | MEN1 | O00255 | 3/20 | 0.54 |
| ▸ | ESR1 | P03372 | 2/20 | 0.54 |
| ▸ | GAA | P10253 | 2/20 | 0.54 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.54 |
| ▸ | MAPT | P10636 | 3/20 | 0.51 |
| ▸ | METAP2 | P50579 | 1/20 | 0.51 |
| ▸ | METAP1 | P53582 | 1/20 | 0.51 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | LMNA | P02545 | 4/20 | 0.44 |
| ▸ | HPGD | P15428 | 3/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8379811 | 0.89 | HSD11B1 (0.68) | HSD11B1HSD17B3ALDH1A1KMT2AMEN1 | |
| SCHEMBL5360886 | 0.84 | KMT2A (0.75) | HSD11B1HSD17B3ALDH1A1KMT2AMEN1 | |
| SCHEMBL9057637 | 0.82 | MAPT (0.41) | HSD11B1HSD17B3ALDH1A1KMT2AMEN1 | |
| SCHEMBL31272384 | 0.82 | ALDH1A1 (0.68) | HSD11B1HSD17B3ALDH1A1KMT2AMEN1 | |
| SCHEMBL5360980 | 0.82 | GAA (0.55) | HSD11B1HSD17B3ALDH1A1KMT2AMEN1 | |
| SCHEMBL8055948 | 0.81 | TDP1 (0.47) | HSD11B1HSD17B3ALDH1A1KMT2AMEN1 | |
| SCHEMBL2879497 | 0.79 | METAP2 (0.60) | HSD11B1HSD17B3ALDH1A1KMT2AMEN1 | |
| SCHEMBL1879537 | 0.76 | LMNA (0.50) | HSD11B1HSD17B3ALDH1A1KMT2AMEN1 | |
| SCHEMBL8201685 | 0.76 | HSD11B1 (0.61) | HSD11B1HSD17B3ALDH1A1KMT2AMEN1 | |
| SCHEMBL10725970 | 0.76 | KMT2A (0.51) | HSD11B1HSD17B3ALDH1A1KMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106019841-A | Photosensitive resin composition, pattern forming method, cured film, insulation film, color filter and display device | 东京应化工业株式会社 | 2016-10-12 | — | — | CN | disclosed |
| US-7179399-B2 | Material for forming protective film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-6693049-B2 | FILLING WITH AN OXYALKYLATED MELAMINE, BENZOGUANAMINE, ACETOGUANAMINE, GLYCOL URYL, UREA, THIOUREA, GUANIDINE, ALKYLENEUREA OR SUCCINYLAMIDE AND HEATING AT 150-250 C, WHEREBY NO BUBBLE IS GENERATED WHEN THE FINE HOLE IS FILLED. | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-02-17 | — | — | US | disclosed |
| US-20030032280-A1 | Method for filling fine hole | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-02-13 | — | — | US | disclosed |
| US-20020182360-A1 | Material for forming protective film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-12-05 | — | — | US | disclosed |
| EP-0749044-B1 | Positive-working photoresist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2000-09-06 | — | — | EP | disclosed |
| EP-0749046-B1 | Positive-working photoresist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2000-05-10 | — | — | EP | disclosed |
| US-5948589-A | HIGH SENSITIVITY AND HIGH RESOLUTION CAPABLE OF EXHIBITING HIGH STABILITY OF LATENT IMAGES; TERT-BUTYOXYCARBONYL-SUBSTITUTED POLYVINYLPHENOL AND ALKOXYALKYL-SUBSTITUTED POLYVINYLPHENOL. | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-09-07 | — | — | US | disclosed |
| US-5874195-A | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-02-23 | — | — | US | disclosed |
| US-5856058-A | HALATION INHIBITOR WHICH IS AN ESTERIFICATION PRODUCT BETWEEN A SPECIFIED PHENOLIC COMPOUND AND A NAPHTHOQUINONE-1,2-DIAZIDE SULFONIC ACID. | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-01-05 | — | — | US | disclosed |
| US-5770343-A | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-06-23 | — | — | US | disclosed |
| EP-0749046-A1 | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-12-18 | — | — | EP | disclosed |
| EP-0749044-A2 | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-12-18 | — | — | EP | disclosed |