Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TRPV4 | Q9HBA0 | 1/20 | 0.36 |
| ▸ | ALPL | P05186 | 1/20 | 0.34 |
| ▸ | ALPI | P09923 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | PGR | P06401 | 3/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | CTPS1 | P17812 | 1/20 | 0.30 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.30 |
| ▸ | NR3C2 | P08235 | 1/20 | 0.30 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5401430 | 0.86 | RAB9A (0.38) | ALPLALPIL3MBTL1ALDH1A1PGR | |
| SCHEMBL5400599 | 0.85 | ALPL (0.38) | ALPLALPIL3MBTL1ALDH1A1PGR | |
| SCHEMBL5401558 | 0.82 | HSD17B2 (0.41) | ALPLALPIL3MBTL1ALDH1A1 | |
| SCHEMBL5400412 | 0.81 | PGR (0.42) | ALPLALPIL3MBTL1ALDH1A1PGR | |
| SCHEMBL5414726 | 0.81 | TP53 (0.35) | ALPLALPIL3MBTL1ALDH1A1PGR | |
| SCHEMBL5412226 | 0.79 | CA2 (0.36) | ALPLALPIL3MBTL1ALDH1A1SMN1; SMN2 | |
| SCHEMBL5404679 | 0.78 | NPC1 (0.36) | ALPLALPIL3MBTL1LMNASMN1; SMN2 | |
| SCHEMBL5403656 | 0.76 | MAPT (0.37) | TRPV4ALDH1A1LMNASMN1; SMN2 | |
| SCHEMBL5404365 | 0.75 | CNR2 (0.39) | L3MBTL1ALDH1A1LMNASMN1; SMN2 | |
| SCHEMBL7896688 | 0.74 | TYR (0.36) | ALDH1A1PGRMCOLN3LMNASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7312014-B2 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-20040170918-A1 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2004-09-02 | — | — | US | disclosed |
| EP-1406123-A1 | RESIST COMPOSITIONS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-04-07 | — | — | EP | disclosed |