Toliodium

Toliodium

SCHEMBL5401599

Cc1ccc([I+]c2ccc(C)cc2)cc1.O=S(=O)([O-])c1cccc(F)c1

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HCRTR2 O43614 1/20 0.41
ACHE P22303 2/20 0.39
LMNA P02545 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
NFE2L2 Q16236 1/20 0.38
HTR2C P28335 2/20 0.37
KDM4E B2RXH2 1/20 0.37
NPC1 O15118 1/20 0.37
ALDH1A1 P00352 1/20 0.37
POLB P06746 1/20 0.37
MAPT P10636 1/20 0.37
RAB9A P51151 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
HTR2A P28223 1/20 0.37
GRM5 P41594 1/20 0.37
BCHE P06276 1/20 0.37
TLR9 Q9NR96 1/20 0.37
HTR2B P41595 1/20 0.37
MMP2 P08253 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5419133 0.86 PGR (0.41) NFE2L2HTR2CKDM4EALDH1A1MAPT
SCHEMBL5409943 0.84 ALDH1A1 (0.43) LMNAHTR2CKDM4EALDH1A1MAPT
SCHEMBL5403682 0.84 CA2 (0.39) HCRTR2LMNAHTR2CKDM4EALDH1A1
SCHEMBL5412394 0.84 CA1 (0.39) ACHELMNAHTR2CALDH1A1SMN1; SMN2
Toliodium SCHEMBL5400817 0.82 ACHE (0.46) ACHELMNAALDH1A1BCHETLR9
SCHEMBL5382700 0.82 ACHE (0.46) ACHELMNAALDH1A1BCHETLR9
SCHEMBL5413749 0.82 CA2 (0.42) LMNAHTR2CALDH1A1POLBSMN1; SMN2
Toliodium SCHEMBL5398408 0.81 FFAR1 (0.52) ACHELMNANFE2L2ALDH1A1POLB
Toliodium SCHEMBL2895872 0.80 MMP2 (0.45) ACHELMNATDP1KDM4EALDH1A1
SCHEMBL23202629 0.80 LMNA (0.47) LMNATDP1NFE2L2HTR2CHTR2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7312014-B2 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2007-12-25 US disclosed
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US disclosed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP disclosed