Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 17/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | NR1H3 | Q13133 | 2/20 | 0.41 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17445916 | 0.83 | ALDH1A1 (0.48) | ALDH1A1NR1H3NR1H2 | |
| SCHEMBL6838055 | 0.83 | ALDH1A1 (0.48) | HSD11B1ALDH1A1NR1H3NR1H2 | |
| SCHEMBL10165226 | 0.82 | HSD11B1 (0.59) | HSD11B1NR1H3NR1H2 | |
| SCHEMBL13675477 | 0.80 | HSD11B1 (0.50) | HSD11B1NR1H3 | |
| SCHEMBL12635205 | 0.80 | HSD11B1 (0.35) | HSD11B1NR1H3NR1H2 | |
| SCHEMBL3637391 | 0.80 | HSD11B1 (0.50) | HSD11B1NR1H3 | |
| SCHEMBL643498 | 0.79 | NR1H2 (0.56) | ALDH1A1NR1H3NR1H2 | |
| SCHEMBL1474017 | 0.79 | ALDH1A1 (0.48) | ALDH1A1NR1H3NR1H2 | |
| SCHEMBL15615108 | 0.79 | ALDH1A1 (0.48) | ALDH1A1NR1H3NR1H2 | |
| SCHEMBL14748502 | 0.79 | PTPN5 (0.40) | HSD11B1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 244 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240241441-A1 | POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-07-18 | — | — | US | disclosed |
| US-12036025-B2 | Bio-electrode, method for manufacturing bio-electrode, and method for measuring biological signal | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12038692-B2 | Method for producing substrate with patterned film and fluorine-containing copolymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12038691-B2 | Method for producing substrate with patterned film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-07-16 | — | — | US | disclosed |
| US-20240215891-A1 | Bio-Electrode Composition, Bio-Electrode, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240215890-A1 | Bio-Electrode, Bio-Electrode Composition, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20230400769-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20230375925-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN | FUJIFILM CORPORATION (JP) | 2023-11-23 | — | — | US | disclosed |
| US-11822248-B2 | Coating compositions for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2023-11-21 | — | — | US | disclosed |
| US-20230367210-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20110150977-A1 | ANTIMICROBIAL POLYMERS AND METHODS OF MANUFACTURE THEREOF | AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) | 2011-06-23 | — | — | US | disclosed |
| US-20110086312-A1 | Positive-Working Photoimageable Bottom Antireflective Coating | AZ ELECTRONIC MATERIALS USA CORP. | 2011-04-14 | — | — | US | disclosed |
| WO-2011042770-A1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2011-04-14 | — | — | WO | disclosed |
| WO-2011039560-A1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2011-04-07 | — | — | WO | disclosed |
| US-20110076626-A1 | Positive-Working Photoimageable Bottom Antireflective Coating | MERCK PATENT GMBH (DE) | 2011-03-31 | — | — | US | disclosed |
| US-7202011-B2 | Photosensitive polymer including fluorine and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-04-10 | — | — | US | disclosed |
| US-6800418-B2 | ALLOWING DEVELOPMENT WITH CONVENTIONAL DEVELOPERS AND HAVING A HIGH TRANSMITTANCE AT A F2 EXCIMER LASER WAVELENGTH OF 157 NM, HYDROPHILICITY, ADHESION TO UNDERLAYER | SAMSUNG ELECTRONICS (KR) | 2004-10-05 | — | — | US | disclosed |
| US-20030228537-A1 | Photosensitive polymer including fluorine and resist composition containing the same | SAMSUNG ELECTRONICS CO.; LTD. (KR) | 2003-12-11 | — | — | US | disclosed |
| US-20030157430-A1 | Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-08-21 | — | — | US | disclosed |
| EP-0881266-A2 | Polymers inhibiting denaturation of adsorbed proteins | HÜLS AKTIENGESELLSCHAFT (DE) | 1998-12-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110150977-A1 | ANTIMICROBIAL POLYMERS AND METHODS OF MANUFACTURE THEREOF | MLEC, NOD2, PAM | HSD11B1 4670/4885ALDH1A1 3648/4885NR1H3 4633/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.