SCHEMBL547314

SCHEMBL547314

O=C(OCC12CC3CC(CC(CO)(C3)C1)C2)C(F)(F)S(=O)(=O)[O-].c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.34

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
SCN9A Q15858 3/20 0.34
ALDH1A1 P00352 2/20 0.32
LMNA P02545 1/20 0.32
HSD11B1 P28845 1/20 0.32
KMT2A Q03164 2/20 0.31
P2RX7 Q99572 4/20 0.31
PRSS1 P07477 1/20 0.31
TPSAB1 Q15661 1/20 0.31
TPSD1 Q9BZJ3 1/20 0.31
TPSG1 Q9NRR2 1/20 0.31
GAA P10253 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL525455 0.91 SCN9A (0.37) SCN9AALDH1A1LMNAP2RX7GAA
SCHEMBL30029494 0.91 SCN9A (0.37) SCN9AALDH1A1LMNAP2RX7GAA
SCHEMBL242790 0.91 P2RX7 (0.36) SCN9AALDH1A1KMT2AP2RX7
SCHEMBL2381748 0.85 MEN1 (0.43) ALDH1A1LMNAHSD11B1KMT2AGAA
SCHEMBL30361501 0.85 SCN9A (0.34) SCN9A
SCHEMBL29721445 0.85 SCN9A (0.35) SCN9AALDH1A1HSD11B1KMT2A
SCHEMBL1635652 0.85 SCN9A (0.32) SCN9A
SCHEMBL1635900 0.85 SCN9A (0.32) SCN9A
SCHEMBL961482 0.83 SCN9A (0.34) SCN9AALDH1A1HSD11B1KMT2AP2RX7
SCHEMBL30361487 0.83 SCN9A (0.33) SCN9AALDH1A1KMT2AP2RX7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8329377-B2 Imide compound and chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-12-11 US disclosed
US-8173350-B2 Oxime compound and resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-05-08 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100028807-A1 Imide Compound and Chemically Amplified Resist Composition Containing The Same SUMITOMO CHEMICAL COMPANY, LTD. (JP) 2010-02-04 US disclosed
US-20100021847-A1 Oxime Compound and Resist Composition Containing the Same SUMITOMO CHEMICAL COMPANY, LTD. (JP) 2010-01-28 US disclosed
US-7304175-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-12-04 US disclosed
US-20060194982-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-08-31 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060194982-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same ASIC1, SLC9A1, NHERF1 SCN9A 39/4885ALDH1A1 840/4885LMNA 2076/4885
US-20100028807-A1 Imide Compound and Chemically Amplified Resist Composition Containing The Same IGF1R, CCNA1, MYC SCN9A 2010/4885ALDH1A1 386/4885LMNA 2411/4885
US-20100021847-A1 Oxime Compound and Resist Composition Containing the Same CYC1, UQCRB, CBR1 SCN9A 1835/4885ALDH1A1 1280/4885LMNA 1922/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.