Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN1 | P18031 | 13/20 | 0.56 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.47 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | MITF | O75030 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.47 |
| ▸ | RAB9A | P51151 | 1/20 | 0.47 |
| ▸ | GFER | P55789 | 1/20 | 0.47 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.47 |
| ▸ | ATM | Q13315 | 1/20 | 0.47 |
| ▸ | MDM2 | Q00987 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 2/20 | 0.45 |
| ▸ | CES2 | O00748 | 1/20 | 0.45 |
| ▸ | CES1 | P23141 | 1/20 | 0.45 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27683344 | 0.94 | PTPN1 (0.50) | PTPN1EPHX1PTPN2SMN1; SMN2MITF | |
| SCHEMBL6203944 | 0.84 | EPHX1 (0.65) | PTPN1EPHX1PTPN2SMN1; SMN2MITF | |
| SCHEMBL29240046 | 0.79 | PTPN1 (0.59) | PTPN1EPHX1PTPN2RAB9AMDM2 | |
| SCHEMBL27608839 | 0.77 | PTPN1 (0.57) | PTPN1EPHX1PTPN2ALDH1A1MDM2 | |
| SCHEMBL29240033 | 0.77 | PTPN1 (0.67) | PTPN1EPHX1PTPN2 | |
| SCHEMBL2922282 | 0.77 | MITF (0.59) | PTPN1SMN1; SMN2MITFALDH1A1HTT | |
| SCHEMBL6327117 | 0.75 | PTPN1 (0.55) | PTPN1ALDH1A1RAB9ALMNAHSD17B10 | |
| SCHEMBL9099547 | 0.75 | ESR1 (0.49) | SMN1; SMN2ALDH1A1ATMLMNATSHR | |
| Benzoin SCHEMBL710405 | 0.74 | LMNA (0.75) | SMN1; SMN2ALDH1A1LMNACES2CES1 | |
| SCHEMBL6203634 | 0.74 | NTSR1 (0.57) | PTPN1EPHX1MDM2LMNAHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | claimed |
| US-5916728-A | RESIN WHICH IS CONVERTED TO ALKALI-SOLUBLE FROM ALKALI-INSOLUBLE OR ALKALI-SLIGHTLY SOLUBLE BY THE ACTION OF AN ACID, ACID GENERATOR AND TERTIARY AMINE COMPOUND HAVING AN ALIPHATIC HYDROXYL GROUP. | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-06-29 | — | — | US | claimed |
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | disclosed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | disclosed |
| US-20240206290-A1 | DISPLAY PANEL AND MANUFACTURING METHOD THEREOF | SAMSUNG DISPLAY CO., LTD. (KR) | 2024-06-20 | — | — | US | disclosed |
| US-20150301452-A1 | PHOTORESIST COMPOSITION AND METHOD OF FABRICATING DISPLAY SUBSTRATE USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2015-10-22 | — | — | US | disclosed |
| US-8524440-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-09-03 | — | — | US | disclosed |
| US-8378016-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-19 | — | — | US | disclosed |
| US-8329377-B2 | Imide compound and chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-12-11 | — | — | US | disclosed |
| EP-1225479-B1 | A chemical amplifying type positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2012-12-05 | — | — | EP | disclosed |
| US-6153349-A | COMPRISING POLYVINYLPHENOL DERIVATIVE RESIN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-11-28 | — | — | US | disclosed |
| EP-0982628-A2 | A chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-03-01 | — | — | EP | disclosed |
| EP-0955563-A1 | A photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-11-10 | — | — | EP | disclosed |
| EP-0945764-A2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-09-29 | — | — | EP | disclosed |
| US-5916728-A | RESIN WHICH IS CONVERTED TO ALKALI-SOLUBLE FROM ALKALI-INSOLUBLE OR ALKALI-SLIGHTLY SOLUBLE BY THE ACTION OF AN ACID, ACID GENERATOR AND TERTIARY AMINE COMPOUND HAVING AN ALIPHATIC HYDROXYL GROUP. | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-06-29 | — | — | US | disclosed |
| US-5891601-A | DIPYRIDYL COMPOUND | SUMITOMO CHEMICAL COMPANY, LTD. (JP) | 1999-04-06 | — | — | US | disclosed |
| EP-0856773-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-08-05 | — | — | EP | disclosed |
| EP-0837368-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1998-04-22 | — | — | EP | disclosed |
| EP-0837367-A2 | Positive resist composition comprising a dipyridyl compound | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1998-04-22 | — | — | EP | disclosed |