Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 2/20 | 0.37 |
| ▸ | CA2 | P00918 | 2/20 | 0.37 |
| ▸ | CA7 | P43166 | 1/20 | 0.37 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | F2 | P00734 | 2/20 | 0.32 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.32 |
| ▸ | PRSS2 | P07478 | 2/20 | 0.32 |
| ▸ | PRSS3 | P35030 | 2/20 | 0.32 |
| ▸ | CA5A | P35218 | 1/20 | 0.31 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.31 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL4825075 | 0.89 | ALDH1A1 (0.47) | ALDH1A1L3MBTL1CA1CA2CA7 | |
| Trifluoromethanesulfonic Acid SCHEMBL8067232 | 0.89 | ALDH1A1 (0.47) | ALDH1A1L3MBTL1CA1CA2CA7 | |
| Trifluoromethanesulfonic Acid SCHEMBL8054873 | 0.89 | ALDH1A1 (0.47) | ALDH1A1L3MBTL1CA1CA2CA7 | |
| Trifluoromethanesulfonic Acid SCHEMBL8068862 | 0.89 | ALDH1A1 (0.47) | ALDH1A1L3MBTL1CA1CA2CA7 | |
| Trifluoromethanesulfonic Acid SCHEMBL3968739 | 0.89 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL8066536 | 0.89 | ALDH1A1 (0.47) | ALDH1A1L3MBTL1CA1CA2CA7 | |
| Trifluoromethanesulfonic Acid SCHEMBL8065122 | 0.89 | ALDH1A1 (0.47) | ALDH1A1L3MBTL1CA1CA2CA7 | |
| Trifluoromethanesulfonic Acid SCHEMBL8071267 | 0.89 | ALDH1A1 (0.47) | ALDH1A1L3MBTL1CA1CA2CA7 | |
| Trifluoromethanesulfonic Acid SCHEMBL8055527 | 0.89 | ALDH1A1 (0.47) | ALDH1A1L3MBTL1CA1CA2CA7 | |
| Trifluoromethanesulfonic Acid SCHEMBL8054999 | 0.89 | ALDH1A1 (0.47) | ALDH1A1L3MBTL1CA1CA2CA7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 364 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115418181-A | Antistatic silica gel protection film | 惠州市浩明科技股份有限公司 | 2022-12-02 | — | — | CN | claimed |
| CN-104098078-B | Activation MCMB, its preparation method and ultracapacitor | 中国科学院长春应用化学研究所 | 2016-09-28 | — | — | CN | claimed |
| US-6699621-B2 | ELECTROPOLYMERIZING MONOMERS ON TO A SUBSTRATE IN A POLYMERIZATION SOLUTION; ELECTROCHEMICALLY CONDITIONING POLYMER SO AS TO INCREASE DISCHARGE EFFICIENCY AND CHARGE CAPACITY; DOPING TO IMPART A NON-NEUTRAL CHARGE | JOHNS HOPKINS UNIVERSITY | 2004-03-02 | — | — | US | claimed |
| US-20260146026-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | ADEKA CORPORATION (JP) | 2026-05-28 | — | — | US | disclosed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4700067-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPERSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-25 | — | — | EP | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20260029706-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-29 | — | — | US | disclosed |
| US-20260008932-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-08 | — | — | US | disclosed |
| EP-4675357-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-01-07 | — | — | EP | disclosed |
| WO-1998019355-A1 | AN ELECTROCHEMICAL STORAGE CELL CONTAINING AT LEAST ONE ELECTRODE FORMULATED FROM A FLUOROPHENYL THIOPHENE POLYMER | THE JOHNS-HOPKINS UNIVERSITY (US) | 1998-05-07 | — | — | WO | disclosed |
| US-5733683-A | ELECTROCONDUCTIVE POLYMER OF FLUOROPHENYL POLYTHIOPHENE FOR ELECTROLYTIC CELLS | THE JOHNS HOPKINS UNIVERSITY (US) | 1998-03-31 | — | — | US | disclosed |
| US-5728796-A | Process to react epoxide-containing compounds and aliphatic alcohols | THE DOW CHEMICAL COMPANY (US) | 1998-03-17 | — | — | US | disclosed |
| CN-1174854-A | Electrolyte and electrolytic cell | ROHM & HAAS (US) | 1998-03-04 | — | — | CN | disclosed |
| EP-0821368-A2 | Electrolyte and electrolytic cell | ROHM AND HAAS COMPANY (US) | 1998-01-28 | — | — | EP | disclosed |
| CN-1138338-A | Method for reacting epoxide-containing compounds with aliphatic alcohols | DOW CHEMICAL CO (US) | 1996-12-18 | — | — | CN | disclosed |
| EP-0736052-A1 | PROCESS TO REACT EPOXIDE-CONTAINING COMPOUNDS AND ALIPHATIC ALCOHOLS | THE DOW CHEMICAL COMPANY (US) | 1996-10-09 | — | — | EP | disclosed |
| US-5527640-A | DOPABLE POLYTHIOPHENES; TETRAALKYLAMMONIUM SALTS AS ELECTROLYTE | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, OFFICE OF TECHNOLOGY TRANSFER (US) | 1996-06-18 | — | — | US | disclosed |
| WO-1995017445-A1 | PROCESS TO REACT EPOXIDE-CONTAINING COMPOUNDS AND ALIPHATIC ALCOHOLS | THE DOW CHEMICAL COMPANY (US) | 1995-06-29 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260008932-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | ASH2L, ALKBH2, ITGA1 | ALDH1A1 841/4885L3MBTL1 1216/4885CA1 29/4885 |
| US-20260146026-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | CBR3, CBR1, NOTUM | ALDH1A1 827/4885L3MBTL1 2247/4885CA1 467/4885 |
| US-20260029706-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT | SMC2, F12, SMC1A | ALDH1A1 1644/4885L3MBTL1 2207/4885CA1 297/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | ALDH1A1 4452/4885L3MBTL1 1596/4885CA1 1449/4885 |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SMC1A, SPOUT1, LBR | ALDH1A1 1558/4885L3MBTL1 282/4885CA1 964/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.