SCHEMBL5521097

SCHEMBL5521097

Cc1cc(C)c(S(=O)(=O)OCc2ccccc2[N+](=O)[O-])c(C)c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.43
HTT P42858 2/20 0.43
MAOB P27338 1/20 0.42
TSHR P16473 1/20 0.42
HSD17B10 Q99714 1/20 0.41
ACHE P22303 1/20 0.41
MAPT P10636 4/20 0.41
MAPK1 P28482 2/20 0.41
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
CA12 O43570 1/20 0.40
CA9 Q16790 1/20 0.40
HPGD P15428 1/20 0.39
KDM4E B2RXH2 1/20 0.38
GAA P10253 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
THRB P10828 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27685985 0.86 ACHE (0.46) ALDH1A1HTTMAOBTSHRHSD17B10
SCHEMBL5136204 0.82 ALDH1A1 (0.54) ALDH1A1HTTMAOBTSHRHSD17B10
SCHEMBL59186 0.82 ALDH1A1 (0.49) ALDH1A1HTTMAOBTSHRACHE
SCHEMBL5521103 0.80 CA2 (0.49) ALDH1A1HTTMAOBTSHRMAPT
SCHEMBL17567284 0.80 ALDH1A1 (0.43) ALDH1A1HTTHSD17B10MAPTMAPK1
SCHEMBL244116 0.77 ALDH1A1 (0.49) ALDH1A1HTTMAOBTSHRMEN1
SCHEMBL1089020 0.77 ALDH1A1 (0.51) ALDH1A1HTTMAOBTSHRHSD17B10
SCHEMBL14411092 0.77 ALDH1A1 (0.55) ALDH1A1HTTMAOBTSHRHSD17B10
SCHEMBL8430876 0.77 ALDH1A1 (0.55) ALDH1A1HTTMAOBTSHRHSD17B10
SCHEMBL28856088 0.76 ALDH1A1 (0.44) ALDH1A1HTTMAOBTSHRACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2013141376-A1 PROTECTANT, METHOD FOR PRODUCING COMPOUND PROTECTED BY PROTECTANT, RESIN PROTECTED BY PROTECTANT, PHOTOSENSITIVE RESIN COMPOSITION CONTAINING RESIN PROTECTED BY PROTECTANT, PATTERN-FORMING MATERIAL, PHOTOSENSITIVE FILM, CURED RELIEF PATTERN, METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 (JP) 2013-09-26 WO disclosed
WO-2013018524-A1 PHOTOSENSITIVE RESIN COMPOSITION, MATERIAL FOR FORMING RELIEF PATTERN, PHOTOSENSITIVE FILM, POLYIMIDE FILM, CURED RELIEF PATTERN AND METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 (JP) 2013-02-07 WO disclosed
US-8173349-B2 Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device FUJIFILM CORPORATION (JP) 2012-05-08 US disclosed
US-20100080963-A1 PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
US-7615324-B2 Photosensitive composition, and cured relief pattern production method and semiconductor device using the same FUJIFILM CORPORATION (JP) 2009-11-10 US disclosed
US-20080227024-A1 PHOTOSENSITIVE COMPOSITION, AND CURED RELIEF PATTERN PRODUCTION METHOD AND SEMICONDUCTOR DEVICE USING THE SAME FUJIFILM CORPORATION (JP) 2008-09-18 US disclosed