Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.46 |
| ▸ | NPC1 | O15118 | 1/20 | 0.46 |
| ▸ | RAB9A | P51151 | 1/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | CA12 | O43570 | 2/20 | 0.45 |
| ▸ | CA9 | Q16790 | 1/20 | 0.45 |
| ▸ | TSHR | P16473 | 2/20 | 0.45 |
| ▸ | MAOB | P27338 | 1/20 | 0.45 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | THRB | P10828 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28296023 | 0.88 | ALDH1A1 (0.45) | ALDH1A1HSD17B10KMT2AMEN1SMN1; SMN2 | |
| SCHEMBL27685985 | 0.87 | ACHE (0.46) | ALDH1A1HSD17B10KMT2AMEN1SMN1; SMN2 | |
| SCHEMBL5135093 | 0.86 | HSD17B10 (0.49) | ALDH1A1HSD17B10KMT2AMEN1SMN1; SMN2 | |
| SCHEMBL5136631 | 0.85 | ALDH1A1 (0.45) | ALDH1A1HSD17B10KMT2AMEN1SMN1; SMN2 | |
| SCHEMBL29039134 | 0.83 | LMNA (0.55) | ALDH1A1KMT2AMEN1SMN1; SMN2NPC1 | |
| SCHEMBL29284824 | 0.83 | MEN1 (0.42) | ALDH1A1KMT2AMEN1HTTMAOB | |
| SCHEMBL59186 | 0.83 | ALDH1A1 (0.49) | ALDH1A1KMT2AMEN1SMN1; SMN2RAB9A | |
| SCHEMBL5521097 | 0.82 | ALDH1A1 (0.43) | ALDH1A1HSD17B10KMT2AMEN1SMN1; SMN2 | |
| SCHEMBL244116 | 0.81 | ALDH1A1 (0.49) | ALDH1A1KMT2AMEN1RAB9AHTT | |
| SCHEMBL14411092 | 0.80 | ALDH1A1 (0.55) | ALDH1A1HSD17B10KMT2AMEN1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113913075-A | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-01-11 | — | — | CN | claimed |
| CN-101185030-B | Antireflective hardmask composition and method of using same | CHEIL IND INC | 2012-04-18 | — | — | CN | claimed |
| CN-101283462-B | Organic light emitting device having an intrinsic active layer and method of fabricating the same | GEN ELECTRIC | 2011-08-24 | — | — | CN | claimed |
| CN-101238413-B | Antireflective hardmask composition and methods for using same | CHEIL IND INC | 2011-08-17 | — | — | CN | claimed |
| CN-101238414-B | Antireflective hardmask compositions and methods of using same | CHEIL IND INC | 2011-03-09 | — | — | CN | claimed |
| CN-1991581-B | Hardmask composition coated under photoresist and process of producing integrated circuit devices using thereof | CHEIL IND INC | 2010-05-26 | — | — | CN | claimed |
| CN-101681096-A | Hardmask composition having antireflective properties and method of patterning material on substrate using the same | CHEIL IND INC | 2010-03-24 | — | — | CN | claimed |
| CN-101641390-A | Hardmask composition having antireflective property and method of patterning materials using the same | CHEIL IND INC KR | 2010-02-03 | — | — | CN | claimed |
| CN-101283462-A | Organic light emitting device having an intrinsic active layer and method of fabricating the same | GEN ELECTRIC (US) | 2008-10-08 | — | — | CN | claimed |
| CN-101238414-A | Antireflective hardmask compositions and methods of using same | CHEIL IND INC (KR) | 2008-08-06 | — | — | CN | claimed |
| CN-101238413-A | Antireflective hardmask composition and methods for using same | CHEIL IND INC (KR) | 2008-08-06 | — | — | CN | claimed |
| CN-101185030-A | Antireflective hardmask composition and methods for using same | CHEIL IND INC (KR) | 2008-05-21 | — | — | CN | claimed |
| EP-0762207-B1 | Positive working photosensitive composition and method of producing relief structures | BASF AG (DE) | 2000-04-12 | — | — | EP | claimed |
| CN-122025633-A | Polymeric adhesive for electrochemical cells including labels | 通用汽车环球科技运作有限责任公司 | 2026-05-12 | — | — | CN | disclosed |
| US-20260118761-A1 | COMPOUND FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | Tan Kah Kee Innovation Laboratory (CN) | 2026-04-30 | — | — | US | disclosed |
| US-20260118762-A1 | POLYMER FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | Tan Kah Kee Innovation Laboratory (CN) | 2026-04-30 | — | — | US | disclosed |
| US-20020128364-A1 | POLYMERS OBTAINED FROM MONOMERS ALLOWING A SEQUENTIAL POLYMERIZATION, AND THEIR USE FOR PREPARING IONIC CONDUCTORS | HYDRO-QUEBEC (CA) | 2002-09-12 | — | — | US | disclosed |
| CN-1330779-A | Antireflective composition for deep ultraviolet photoresist | CLARIANT INT LTD (CH) | 2002-01-09 | — | — | CN | disclosed |
| CN-1300383-A | Fast-etching, thermosetting anti-reflective coatings derived from cellulosic binders | BREWER SCIENCE INC (US) | 2001-06-20 | — | — | CN | disclosed |
| CN-1292556-A | Dielectric composition | SIPRE CO (US) | 2001-04-25 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118761-A1 | COMPOUND FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | RAD51, COL2A1, MRPL11 | ALDH1A1 4156/4885HSD17B10 1442/4885KMT2A 4209/4885 |
| US-20260118762-A1 | POLYMER FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | SEC23B, SEC23IP, SEC16A | ALDH1A1 4640/4885HSD17B10 1234/4885KMT2A 4237/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.