Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | KCNH3 | Q9ULD8 | 3/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | IDO1 | P14902 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 2/20 | 0.35 |
| ▸ | MAOA | P21397 | 1/20 | 0.34 |
| ▸ | MAOB | P27338 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL134305 | 0.89 | ALDH1A1 (0.53) | MAPTALDH1A1L3MBTL1NPSR1HRH3 | |
| SCHEMBL2116813 | 0.88 | ALDH1A1 (0.52) | MAPTALDH1A1L3MBTL1NPSR1KCNH3 | |
| Hydrochloric Acid SCHEMBL29522911 | 0.88 | ALDH1A1 (0.52) | MAPTALDH1A1L3MBTL1NPSR1HRH3 | |
| SCHEMBL23361372 | 0.86 | ALDH1A1 (0.50) | MAPTALDH1A1L3MBTL1KCNH3 | |
| SCHEMBL17766143 | 0.86 | ALDH1A1 (0.50) | MAPTALDH1A1L3MBTL1KCNH3 | |
| SCHEMBL17766159 | 0.86 | ALDH1A1 (0.50) | MAPTALDH1A1L3MBTL1KCNH3 | |
| SCHEMBL6441905 | 0.84 | ALDH1A1 (0.47) | MAPTALDH1A1L3MBTL1KMT2AKCNH3 | |
| SCHEMBL16147721 | 0.84 | MAPT (0.47) | MAPTALDH1A1L3MBTL1KCNH3CYP1A2 | |
| SCHEMBL4738119 | 0.84 | ALDH1A1 (0.52) | MAPTALDH1A1L3MBTL1KCNH3CYP1A2 | |
| SCHEMBL514494 | 0.84 | ALDH1A1 (0.43) | MAPTALDH1A1L3MBTL1NPSR1KCNH3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 189 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9758689-B2 | Silver nanoparticle inks comprising aminomethylsilanes | XEROX CORPORATION (US) | 2017-09-12 | — | — | US | claimed |
| CN-104860973-B | The purification process of trimethyl gallium | 苏州普耀光电材料有限公司 | 2017-06-09 | — | — | CN | claimed |
| CN-104817580-B | The high-efficiency purifying method of trimethyl indium | 苏州普耀光电材料有限公司 | 2016-09-28 | — | — | CN | claimed |
| CN-104817579-B | The high-efficiency purifying method of triethyl-gallium | 苏州普耀光电材料有限公司 | 2016-09-28 | — | — | CN | claimed |
| CN-104774216-B | The preparation method of high-purity triethyl-gallium | 苏州普耀光电材料有限公司 | 2016-08-24 | — | — | CN | claimed |
| CN-104860973-A | High-efficient purifying method for trimethyl gallium | SUZHOU PUYAO OPTOELECTRONIC MATERIALS CO LTD | 2015-08-26 | — | — | CN | claimed |
| CN-104817579-A | Efficient purifying method of triethyl gallium | SUZHOU PUYAO PHOTOELECTRIC MATERIAL CO LTD | 2015-08-05 | — | — | CN | claimed |
| CN-104817580-A | Efficient purifying method of trimethylindium | SUZHOU PUYAO PHOTOELECTRIC MATERIAL CO LTD | 2015-08-05 | — | — | CN | claimed |
| CN-104774216-A | Preparation method of high-purity triethyl gallium | SUZHOU PUYAO PHOTOELECTRIC MATERIAL CO LTD | 2015-07-15 | — | — | CN | claimed |
| EP-4738010-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME | Toray Industries, Inc. (JP) | 2026-05-06 | — | — | EP | disclosed |
| EP-4704142-A1 | LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Toray Industries, Inc. (JP) | 2026-03-04 | — | — | EP | disclosed |
| US-12545784-B2 | Resin composition, resin composition film, cured film, hollow structure using same, and semiconductor device | TORAY INDUSTRIES, INC. (JP) | 2026-02-10 | — | — | US | disclosed |
| US-12534399-B2 | Laminate and manufacturing method of semiconductor device | TORAY INDUSTRIES, INC. (JP) | 2026-01-27 | — | — | US | disclosed |
| EP-4668018-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND SEMICONDUCTOR DEVICE USING THESE | Toray Industries, Inc. (JP) | 2025-12-24 | — | — | EP | disclosed |
| US-20040197484-A1 | Coating liquid for forming insulating film and method for producing insulating film | SUMITOMO CHEMICAL COMPANY, LIMITED | 2004-10-07 | — | — | US | disclosed |
| CN-1524116-A | Self-reactive/curable water-based solid adhesive and method of bonding with the self-reactive/curable water-based solid adhesive | ����ϣ��ʽ���� | 2004-08-25 | — | — | CN | disclosed |
| US-20040132864-A1 | Self-reactive/curable water-based solid adhesive and method of bonding with the self-reactive/curable water-based solid adhesive | KONISHI CO., LTD. (JP) | 2004-07-08 | — | — | US | disclosed |
| EP-1431366-A1 | SELF−REACTIVE/CURABLE WATER−BASED SOLID ADHESIVE AND METHOD OF BONDING WITH THE SELF−REACTIVE/CURABLE WATER−BASED SOLID ADHESIVE | KONISHI CO., LTD. (JP) | 2004-06-23 | — | — | EP | disclosed |
| EP-1051461-A2 | FUEL COMPOSITIONS EMPLOYING CATALYST COMBUSTION STRUCTURE | ORR, William C. (US) | 2000-11-15 | — | — | EP | disclosed |
| WO-1999066009-A2 | FUEL COMPOSITIONS EMPLOYING CATALYST COMBUSTION STRUCTURE | ORR WILLIAM C (US) | 1999-12-23 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12545784-B2 | Resin composition, resin composition film, cured film, hollow structure using same, and semiconductor device | ASIC1, ASIC3, TET3 | MAPT 2947/4885ALDH1A1 3308/4885L3MBTL1 3020/4885 |
| US-12534399-B2 | Laminate and manufacturing method of semiconductor device | LCP1, CDH1, L1CAM | MAPT 569/4885ALDH1A1 1225/4885L3MBTL1 258/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.