Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | EBP | Q15125 | 4/20 | 0.39 |
| ▸ | DHCR7 | Q9UBM7 | 4/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.38 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | XBP1 | P17861 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 7/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | F2 | P00734 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4835081 | 0.88 | MAPT (0.39) | GAAEBPDHCR7KDM4EMAPT | |
| SCHEMBL4835204 | 0.83 | MAPT (0.42) | GAAEBPDHCR7KDM4EMAPT | |
| SCHEMBL5555744 | 0.78 | VDR (0.55) | KDM4EMAPTCYP1A2CYP3A4HPGD | |
| SCHEMBL4834877 | 0.78 | MAPT (0.38) | GAAEBPDHCR7KDM4EMAPT | |
| SCHEMBL2734945 | 0.77 | CYP3A4 (0.43) | GAAKDM4EMAPTNPSR1CYP1A2 | |
| SCHEMBL65774 | 0.76 | PARL (0.50) | GAAKDM4EMAPTNPSR1CYP1A2 | |
| SCHEMBL11892773 | 0.76 | KDM4E (0.46) | GAAEBPDHCR7KDM4EMAPT | |
| SCHEMBL7519092 | 0.74 | MAPT (0.43) | GAAKDM4EMAPTNPSR1CYP1A2 | |
| SCHEMBL5556202 | 0.74 | KDM4E (0.50) | GAAKDM4EMAPTNPSR1CYP1A2 | |
| SCHEMBL2734947 | 0.74 | ALDH1A1 (0.36) | GAAEBPDHCR7KDM4EMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8173349-B2 | Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device | FUJIFILM CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| US-20100080963-A1 | PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | US | disclosed |
| US-7615324-B2 | Photosensitive composition, and cured relief pattern production method and semiconductor device using the same | FUJIFILM CORPORATION (JP) | 2009-11-10 | — | — | US | disclosed |
| US-20080227024-A1 | PHOTOSENSITIVE COMPOSITION, AND CURED RELIEF PATTERN PRODUCTION METHOD AND SEMICONDUCTOR DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-09-18 | — | — | US | disclosed |