SCHEMBL4834877

SCHEMBL4834877

Cc1cc(C)c(S(=O)(=O)ON2C(=O)C3C4C=CC(C3C2=O)C2C(=O)N(OS(=O)(=O)c3c(C)cc(C)cc3C)C(=O)C42)c(C)c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.38
KDM4E B2RXH2 4/20 0.38
HPGD P15428 3/20 0.38
XBP1 P17861 2/20 0.38
NPSR1 Q6W5P4 2/20 0.38
CYP3A4 P08684 2/20 0.38
CYP2C19 P33261 2/20 0.38
CYP1A2 P05177 1/20 0.38
F2 P00734 5/20 0.37
ALDH1A1 P00352 5/20 0.37
RAPGEF4 Q8WZA2 4/20 0.34
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
MMP1 P03956 1/20 0.34
MMP2 P08253 1/20 0.34
MMP9 P14780 1/20 0.34
MMP8 P22894 1/20 0.34
MMP13 P45452 1/20 0.34
KMT2A Q03164 4/20 0.34
HTT P42858 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4835204 0.91 MAPT (0.42) MAPTKDM4EHPGDXBP1NPSR1
SCHEMBL2734947 0.84 ALDH1A1 (0.36) MAPTKDM4EHPGDXBP1NPSR1
SCHEMBL2734945 0.84 CYP3A4 (0.43) MAPTKDM4EHPGDXBP1NPSR1
SCHEMBL4835081 0.80 MAPT (0.39) MAPTKDM4EHPGDXBP1NPSR1
SCHEMBL4834985 0.78 ALDH1A1 (0.59) MAPTKDM4EHPGDXBP1F2
SCHEMBL5555746 0.78 GAA (0.39) MAPTKDM4EHPGDXBP1NPSR1
SCHEMBL4835774 0.77 VDR (0.56) MAPTKDM4EHPGDXBP1CYP1A2
SCHEMBL3830490 0.76 ALDH1A1 (0.34) CYP3A4CYP2C19ALDH1A1KMT2AMEN1
SCHEMBL5556202 0.76 KDM4E (0.50) MAPTKDM4EHPGDXBP1NPSR1
SCHEMBL7519092 0.76 MAPT (0.43) MAPTKDM4EHPGDXBP1NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition ASIC1, GAR1, RER1 MAPT 868/4885KDM4E 2501/4885HPGD 2276/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.