Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.60 |
| ▸ | KDM4E | B2RXH2 | 8/20 | 0.60 |
| ▸ | HPGD | P15428 | 7/20 | 0.60 |
| ▸ | VDR | P11473 | 2/20 | 0.57 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.49 |
| ▸ | MEN1 | O00255 | 4/20 | 0.49 |
| ▸ | MAPT | P10636 | 6/20 | 0.49 |
| ▸ | F2 | P00734 | 2/20 | 0.48 |
| ▸ | LMNA | P02545 | 2/20 | 0.42 |
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | PARL | Q9H300 | 2/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 2/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | CA3 | P07451 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14509461 | 0.84 | KMT2A (0.68) | ALDH1A1KDM4EHPGDVDRKMT2A | |
| SCHEMBL5551952 | 0.82 | MAPT (0.71) | ALDH1A1KDM4EHPGDVDRKMT2A | |
| SCHEMBL5551953 | 0.81 | VDR (0.55) | ALDH1A1KDM4EHPGDVDRKMT2A | |
| SCHEMBL8778106 | 0.81 | KDM4E (0.76) | ALDH1A1KDM4EHPGDVDRKMT2A | |
| SCHEMBL14595321 | 0.79 | VDR (0.53) | ALDH1A1KDM4EHPGDVDRKMT2A | |
| SCHEMBL5557804 | 0.79 | ALDH1A1 (0.56) | ALDH1A1KDM4EHPGDVDRKMT2A | |
| SCHEMBL1607770 | 0.79 | PARL (0.68) | ALDH1A1KDM4EHPGDVDRKMT2A | |
| SCHEMBL14620103 | 0.79 | VDR (0.68) | ALDH1A1KDM4EHPGDVDRKMT2A | |
| SCHEMBL4831944 | 0.77 | ALDH1A1 (0.54) | ALDH1A1KDM4EHPGDVDRKMT2A | |
| SCHEMBL11150911 | 0.77 | VDR (0.67) | ALDH1A1KDM4EHPGDVDRKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2013141376-A1 | PROTECTANT, METHOD FOR PRODUCING COMPOUND PROTECTED BY PROTECTANT, RESIN PROTECTED BY PROTECTANT, PHOTOSENSITIVE RESIN COMPOSITION CONTAINING RESIN PROTECTED BY PROTECTANT, PATTERN-FORMING MATERIAL, PHOTOSENSITIVE FILM, CURED RELIEF PATTERN, METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE | 富士フイルム株式会社 (JP) | 2013-09-26 | — | — | WO | disclosed |
| WO-2013018524-A1 | PHOTOSENSITIVE RESIN COMPOSITION, MATERIAL FOR FORMING RELIEF PATTERN, PHOTOSENSITIVE FILM, POLYIMIDE FILM, CURED RELIEF PATTERN AND METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE | 富士フイルム株式会社 (JP) | 2013-02-07 | — | — | WO | disclosed |
| US-8173349-B2 | Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device | FUJIFILM CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| US-20100080963-A1 | PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | US | disclosed |
| US-7615324-B2 | Photosensitive composition, and cured relief pattern production method and semiconductor device using the same | FUJIFILM CORPORATION (JP) | 2009-11-10 | — | — | US | disclosed |
| US-20080227024-A1 | PHOTOSENSITIVE COMPOSITION, AND CURED RELIEF PATTERN PRODUCTION METHOD AND SEMICONDUCTOR DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-09-18 | — | — | US | disclosed |