SCHEMBL5572153

SCHEMBL5572153

c1ccc(C(=C(c2ccccc2)c2ccccc2-c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BCAT2 O15382 1/20 0.54
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
CHRNB2 P17787 2/20 0.47
CHRNB4 P30926 2/20 0.47
CHRNA3 P32297 2/20 0.47
CHRNA4 P43681 2/20 0.47
ALDH1A1 P00352 6/20 0.46
HSD17B10 Q99714 2/20 0.46
HPGD P15428 1/20 0.46
BCL2L1 Q07817 1/20 0.46
HNF4A P41235 1/20 0.45
TSHR P16473 1/20 0.44
RECQL P46063 1/20 0.44
TDP1 Q9NUW8 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
BACE1 P56817 1/20 0.42
FABP3 P05413 1/20 0.41
FABP4 P15090 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Biphenyl SCHEMBL29199166 0.98 BCAT2 (0.52) BCAT2MEN1KMT2ASMN1; SMN2CHRNB2
Fluoride SCHEMBL29086928 0.96 BCAT2 (0.50) BCAT2MEN1KMT2ASMN1; SMN2CHRNB2
SCHEMBL22115687 0.87 AKR1C3 (0.41) BCAT2MEN1KMT2ASMN1; SMN2ALDH1A1
SCHEMBL6853035 0.86 HNF4A (0.43) BCAT2MEN1KMT2ASMN1; SMN2CHRNB2
SCHEMBL28442127 0.86 SLC6A4 (0.53) BCAT2MEN1KMT2ASMN1; SMN2HSD17B10
SCHEMBL4071673 0.86 HNF4A (0.47) BCAT2MEN1KMT2ASMN1; SMN2CHRNB2
SCHEMBL28443188 0.86 SLC6A3 (0.51) BCAT2MEN1KMT2ASMN1; SMN2CHRNB2
SCHEMBL28409211 0.86 ALDH1A1 (0.50) BCAT2MEN1KMT2ASMN1; SMN2CHRNB2
SCHEMBL30377373 0.84 GAA (0.56) KMT2ASMN1; SMN2ALDH1A1HSD17B10HPGD
SCHEMBL9998265 0.83 BCAT2 (0.47) BCAT2MEN1KMT2ASMN1; SMN2CHRNB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1585010-A Organic photon high-density only-read disc and producing process thereof UNIV TSINGHUA (CN) 2005-02-23 CN claimed
EP-0845008-B1 FUNCTIONALIZED POLYBUTADIENE RESINS, METHOD FOR MAKING SAME AND THEIR USES SARTOMER CO INC (US) 2001-07-04 EP claimed
CN-114868048-B Optical film, optical laminate, functional glass, and head-up display 日本化药株式会社 2025-02-25 CN disclosed
CN-114957313-B Siloxane-bridged tetraphenyl ethylene derivatives, process for their preparation and their use 山东大学 2024-04-30 CN disclosed
CN-114957313-A Siloxane-bridged tetraphenylethylene derivatives, process for their preparation and their use 山东大学 2022-08-30 CN disclosed
CN-114868048-A Optical film, optical laminate, functional glass, and head-up display 日本化药株式会社 2022-08-05 CN disclosed
CN-112898282-B D-pi-A type AIE-TADF near-infrared luminescent material, preparation method and application thereof 常州大学 2022-06-17 CN disclosed
CN-111039862-B Tetrastyrene Schiff base Al3+ fluorescent probe and preparation method and application thereof 南通大学 2022-03-01 CN disclosed
CN-110746374-B Tetrastyrene Schiff base Zn2+Fluorescent probe and preparation method and application thereof 南通大学 2022-03-01 CN disclosed
CN-110823852-B Preparation method of optical fiber explosive sensor fluorescence sensitive film, optical fiber explosive sensor and explosive vapor detection system 重庆大学 2022-02-18 CN disclosed
CN-112898282-A D-pi-A type AIE-TADF near-infrared luminescent material and preparation method and application thereof 常州大学 2021-06-04 CN disclosed
US-5053315-A Additive improves processibility and ink receptivity EASTMAN KODAK COMPANY (US) 1991-10-01 US disclosed
US-5045432-A Negative working lithography printing plates EASTMAN KODAK COMPANY (US) 1991-09-03 US disclosed
US-5043250-A Negative working; shelf life, image contrast EASTMAN KODAK COMPANY (US) 1991-08-27 US disclosed
EP-0340244-A1 HIGH SPEED AQUEOUS DEVELOPABLE RADIATION-SENSITIVE COMPOSITION AND PRINTING PLATE CONTAINING SAME EASTMAN KODAK COMPANY (US) 1989-11-08 EP disclosed
WO-1988005929-A1 HIGH SPEED AQUEOUS DEVELOPABLE RADIATION-SENSITIVE COMPOSITION AND PRINTING PLATE CONTAINING SAME EASTMAN KODAK COMPANY (US) 1988-08-11 WO disclosed
US-4101326-A Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life including hindered phenols and phosphoric acid esters EASTMAN KODAK COMPANY (US) 1978-07-18 US disclosed
US-4006023-A Photographic polymeric composition containing a leuco dye cyanide THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE DEPARTMENT OF HEALTH, EDUCATION AND WELFARE (US) 1977-02-01 US disclosed
US-3997509-A FIREPROOFING SOLVAY & CIE (BE) 1976-12-14 US disclosed
US-3979368-A COPOLYMERIZATION OF MALEIC ANHYDRIDE WITH AN A-EPIHALOHYDRIN SOLVAY & CIE (BE) 1976-09-07 US disclosed