Propionic Acid

Propionic Acid

SCHEMBL5573582

CCC(=O)[O-].CCC[N+](C)(C)C

nearest known ligand 0.58

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Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
BBOX1 O75936 3/20 0.45
FFAR3 O14843 2/20 0.43
HDAC3 O15379 2/20 0.43
HDAC1 Q13547 2/20 0.43
HDAC2 Q92769 2/20 0.43
HDAC8 Q9BY41 2/20 0.43
SLC22A16 Q86VW1 1/20 0.39
CA1 P00915 1/20 0.39
MEN1 O00255 1/20 0.38
CYP2C19 P33261 1/20 0.38
RECQL P46063 1/20 0.38
KMT2A Q03164 1/20 0.38
ACHE P22303 1/20 0.37
CPT2 P23786 1/20 0.37
CPT1A P50416 1/20 0.37
DNM1 Q05193 2/20 0.36
ADRA2A P08913 1/20 0.36
ADRA1A P35348 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL1896982 0.89 BBOX1 (0.43) BBOX1FFAR3HDAC3HDAC1HDAC2
Bicarbonate SCHEMBL10697126 0.86 BBOX1 (0.42) BBOX1FFAR3HDAC3HDAC1HDAC2
Acetic Acid SCHEMBL3684341 0.86 CA1 (0.44) BBOX1FFAR3HDAC3HDAC1HDAC2
Bicarbonate SCHEMBL9499506 0.86 BBOX1 (0.42) BBOX1FFAR3HDAC3HDAC1HDAC2
Propionic Acid SCHEMBL5572299 0.85 DNM1 (0.50) BBOX1FFAR3HDAC3HDAC1HDAC2
Butyric Acid SCHEMBL5574341 0.85 FFAR3 (0.67) BBOX1FFAR3HDAC3HDAC1HDAC2
Propionic Acid SCHEMBL5571744 0.84 BBOX1 (0.46) BBOX1FFAR3HDAC3HDAC1HDAC2
Propionic Acid SCHEMBL5571699 0.83 DNM1 (0.61) CA1MEN1KMT2AACHEDNM1
Choline SCHEMBL7043034 0.82 MEN1 (0.57) BBOX1FFAR3HDAC3HDAC1HDAC2
Propionic Acid SCHEMBL5571634 0.81 DNM1 (0.65) MEN1KMT2AACHEDNM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070135565-A1 COMPOSITION FOR FORMING POROUS FILM, POROUS FILM AND METHOD FOR FORMING THE SAME, INTERLEVEL INSULATOR FILM, AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2007-06-14 US disclosed
US-7132473-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2006-11-07 US disclosed
EP-1568744-A1 COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-08-31 EP disclosed
US-20040219372-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2004-11-04 US disclosed