Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOB | P27338 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 3/20 | 0.47 |
| ▸ | GPR35 | Q9HC97 | 2/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 3/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | RECQL | P46063 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17253265 | 0.91 | ALDH1A1 (0.46) | MAOBTSHRGPR35ALDH1A1TDP1 | |
| SCHEMBL499373 | 0.88 | GPR35 (0.50) | MAOBTSHRGPR35ALDH1A1TDP1 | |
| SCHEMBL11025870 | 0.86 | MAOB (0.46) | MAOBTSHRGPR35ALDH1A1LMNA | |
| SCHEMBL1108184 | 0.86 | MAOB (0.61) | MAOBTSHRALDH1A1L3MBTL1MEN1 | |
| SCHEMBL5490051 | 0.85 | GPR35 (0.47) | MAOBTSHRGPR35ALDH1A1LMNA | |
| SCHEMBL11062937 | 0.85 | TDP1 (0.53) | MAOBTSHRALDH1A1LMNATDP1 | |
| SCHEMBL8747352 | 0.84 | MAOB (0.59) | MAOBTSHRALDH1A1L3MBTL1MEN1 | |
| SCHEMBL11239213 | 0.84 | MAOB (0.44) | MAOBTSHRGPR35ALDH1A1LMNA | |
| SCHEMBL28944504 | 0.84 | MMP1 (0.41) | MAOBALDH1A1TDP1MEN1KMT2A | |
| SCHEMBL8703265 | 0.84 | TSHR (0.45) | MAOBTSHRALDH1A1TDP1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1239332-B1 | PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF | AZ ELECTRONIC MATERIALS USA (US) | 2007-02-21 | — | — | EP | disclosed |
| US-20060160014-A1 | Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric | NAGAHARA TATSURO | 2006-07-20 | — | — | US | disclosed |
| US-20050287469-A1 | Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric | NAGAHARA TATSURO | 2005-12-29 | — | — | US | disclosed |
| EP-1560069-A1 | PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC | AZ Electronic Materials (Japan) K.K. (JP) | 2005-08-03 | — | — | EP | disclosed |
| EP-1548499-A1 | PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC | AZ Electronic Materials (Japan) K.K. (JP) | 2005-06-29 | — | — | EP | disclosed |
| US-6902875-B2 | Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-06-07 | — | — | US | disclosed |
| US-20040081912-A1 | Photosensitive polysilazane composition and method of forming patterned polysilazane film | AZ ELECTRONIC MATERIALS USA CORP. | 2004-04-29 | — | — | US | disclosed |
| US-20030113657-A1 | Photosensitive ploysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof | MERCK PATENT GMBH (DE) | 2003-06-19 | — | — | US | disclosed |
| EP-1239332-A1 | PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF | CLARIANT INTERNATIONAL LTD. (CH) | 2002-09-11 | — | — | EP | disclosed |
| EP-1164435-A1 | PHOTOSENSITIVE POLYSILAZANE COMPOSITION AND METHOD OF FORMING PATTERNED POLYSILAZANE FILM | TonenGeneral Sekiyu K.K. (JP) | 2001-12-19 | — | — | EP | disclosed |