Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 2/20 | 0.43 |
| ▸ | KCNH2 | Q12809 | 8/20 | 0.40 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.36 |
| ▸ | ACHE | P22303 | 5/20 | 0.35 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.35 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL7647508 | 0.84 | GPR3 (0.42) | GPR3KCNH2HSD11B1ACHEPTGS1 | |
| SCHEMBL563065 | 0.83 | CA2 (0.35) | KCNH2HSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL2110845 | 0.81 | GPR3 (0.40) | GPR3KCNH2HSD11B1ACHEPTGS1 | |
| Trifluoromethanesulfonic Acid SCHEMBL645278 | 0.80 | CYP1A2 (0.41) | GPR3KCNH2ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL31168285 | 0.78 | GPR3 (0.40) | GPR3KCNH2ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL645454 | 0.78 | GPR3 (0.40) | GPR3KCNH2ACHE | |
| SCHEMBL562392 | 0.77 | GAA (0.41) | ALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL8853674 | 0.76 | KCNH2 (0.38) | GPR3KCNH2ACHEALDH1A1 | |
| Hydrochloric Acid SCHEMBL11620242 | 0.76 | TSHR (0.47) | ACHETSHRALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL36457 | 0.76 | GPR3 (0.47) | GPR3KCNH2HSD11B1ACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114591128-B | Direct cross-coupling method of aryl sulfide salt and aryl bromide | 南京工业大学 | 2023-08-22 | — | — | CN | claimed |
| US-8053158-B2 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-11-08 | — | — | US | claimed |
| US-20070202436-A1 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-08-30 | — | — | US | claimed |
| CN-114591128-B | Direct cross-coupling method of aryl sulfide salt and aryl bromide | 南京工业大学 | 2023-08-22 | — | — | CN | disclosed |
| US-8609013-B2 | Method of fabricating a microfabricated structure | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-12-17 | — | — | US | disclosed |
| US-8580484-B2 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-11-12 | — | — | US | disclosed |
| EP-1942375-B1 | Inkjet printer head comprising photosensitive polymer complex containing silver nanoparticles and method of preparing the photosensitive polymer complex | SAMSUNG ELECTRONICS CO LTD (KR) | 2013-02-27 | — | — | EP | disclosed |
| US-20120034735-A1 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | LEE SANG KYUN (KR) | 2012-02-09 | — | — | US | disclosed |
| US-8053158-B2 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-11-08 | — | — | US | disclosed |
| US-7875416-B2 | Composition for forming photosensitive polymer complex and method of preparing photosensitive polymer complex containing silver nanoparticles using the composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-01-25 | — | — | US | disclosed |
| US-20100323298-A1 | Photosensitive composition, microfabrication method using the same, and microfabricated structure thereof | PARK JONG JIN | 2010-12-23 | — | — | US | disclosed |
| US-20030004289-A1 | Acetal group containing norbornene copolymer for photoresist, method for producing the same and photoresist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-01-02 | — | — | US | disclosed |
| US-20020015906-A1 | Polymer for photoresist, method of production thereof and photoresist composition containing polymer | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-02-07 | — | — | US | disclosed |
| EP-0789279-B1 | Polymer and resist material | WAKO PURE CHEM IND LTD (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-6033826-A | POLYHYDROXYSTYRENE DERIVATIVE CONTAINING AN ACETAL OR KETAL GROUP WHICH CAN EASILY BE ELIMINATED IN THE PRESENCE OF AN ACID IN THE MOLECULE AND HAVING A VERY NARROW MOLECULAR WEIGHT DISTRIBUTION GIVES A RESIST MATERIAL | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2000-03-07 | — | — | US | disclosed |
| EP-0704762-B1 | Resist material and pattern formation | WAKO PURE CHEM IND LTD (JP) | 1999-12-15 | — | — | EP | disclosed |
| EP-0789279-A1 | Polymer and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-08-13 | — | — | EP | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |