SCHEMBL564456

SCHEMBL564456

Cc1ccccc1[N+](C)(C)Cc1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.50
KDM4E B2RXH2 1/20 0.50
TDP1 Q9NUW8 1/20 0.50
DNM1 Q05193 2/20 0.39
KMT2A Q03164 3/20 0.38
SMN1; SMN2 Q16637 3/20 0.38
MEN1 O00255 2/20 0.38
TP53 P04637 2/20 0.38
MAPK1 P28482 1/20 0.38
HTT P42858 2/20 0.37
TSHR P16473 2/20 0.37
ACHE P22303 1/20 0.36
TAAR1 Q96RJ0 1/20 0.34
HPGD P15428 2/20 0.33
LMNA P02545 1/20 0.33
ALOX12 P18054 1/20 0.33
CALM1 P0DP23 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL31362231 0.98 ALDH1A1 (0.54) ALDH1A1KDM4ETDP1DNM1KMT2A
SCHEMBL4649332 0.83 ALDH1A1 (0.42) ALDH1A1KDM4ETDP1DNM1KMT2A
Trifluoromethanesulfonic Acid SCHEMBL565377 0.83 GPR3 (0.36) ALDH1A1KDM4ETDP1ACHEHPGD
Bromide SCHEMBL5117868 0.82 ALDH1A1 (0.41) ALDH1A1KDM4ETDP1DNM1KMT2A
SCHEMBL31413514 0.82 LTA4H (0.46) ALDH1A1KDM4ETDP1SMN1; SMN2HTT
Fluoride SCHEMBL26928814 0.81 LTA4H (0.44) ALDH1A1KDM4ETDP1SMN1; SMN2HTT
Fluoride Ion SCHEMBL26928818 0.81 LTA4H (0.44) ALDH1A1KDM4ETDP1SMN1; SMN2HTT
SCHEMBL28423034 0.80 KDM4E (0.47) ALDH1A1KDM4ETDP1DNM1KMT2A
SCHEMBL28256353 0.78 ALDH1A1 (0.48) ALDH1A1KDM4ETDP1DNM1KMT2A
SCHEMBL4649848 0.78 ALDH1A1 (0.48) ALDH1A1KDM4ETDP1DNM1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3796086-B1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHINETSU CHEMICAL CO (JP) 2024-02-28 EP disclosed
US-8729166-B2 Polymer composition for microelectronic assembly PROMERUS, LLC (US) 2014-05-20 US disclosed
US-20140024750-A1 Polymer Composition for Microelectronic Assembly PROMERUS, LLC (US) 2014-01-23 US disclosed
US-8575248-B2 Polymer composition for microelectronic assembly PROMERUS, LLC (US) 2013-11-05 US disclosed
EP-2601239-A1 POLYMER COMPOSITION FOR MICROELECTRONIC ASSEMBLY Promerus, LLC (US) 2013-06-12 EP disclosed
US-20120034387-A1 Polymer Composition for Microelectronic Assembly PROMERUS LLC (US) 2012-02-09 US disclosed
WO-2012019092-A1 POLYMER COMPOSITION FOR MICROELECTRONIC ASSEMBLY PROMERUS LLC (US) 2012-02-09 WO disclosed