SCHEMBL564656

SCHEMBL564656

CN(C)C(=S)SCCCS(=O)(=O)O.[NaH]

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.34
LMNA P02545 3/20 0.33
ALDH1A1 P00352 3/20 0.33
HTT P42858 2/20 0.33
MGLL Q99685 2/20 0.33
L3MBTL1 Q9Y468 2/20 0.33
KDM4E B2RXH2 1/20 0.33
MEN1 O00255 1/20 0.33
FAAH O00519 1/20 0.33
JAK2 O60674 1/20 0.33
BBOX1 O75936 1/20 0.33
TP53 P04637 1/20 0.33
ALDH2 P05091 1/20 0.33
HSP90AA1 P07900 1/20 0.33
CYP3A4 P08684 1/20 0.33
FBP1 P09467 1/20 0.33
MAPT P10636 1/20 0.33
PKM P14618 1/20 0.33
HPGD P15428 1/20 0.33
ALOX15 P16050 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL292860 0.98 APP (0.35) APPLMNAALDH1A1HTTMGLL
SCHEMBL30608208 0.96 APP (0.34) APPLMNAALDH1A1HTTMGLL
SCHEMBL28404865 0.86 LMNA (0.37) LMNAALDH1A1HTTMGLLL3MBTL1
SCHEMBL13321325 0.83 ALDH1A1 (0.36) LMNAALDH1A1HTTMGLLL3MBTL1
SCHEMBL6700776 0.80 MGLL (0.48) APPLMNAALDH1A1HTTMGLL
SCHEMBL1258660 0.80 LMNA (0.36) LMNAALDH1A1HTTMGLLL3MBTL1
SCHEMBL28745735 0.77 CHRNB2 (0.44) APPLMNACYP2C19
SCHEMBL18714336 0.76
SCHEMBL20013245 0.76 APP (0.35) APP
SCHEMBL19629284 0.74 ALDH1A1 (0.40) LMNAALDH1A1HTTMGLLL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9780380-B2 Current collector for battery and secondary battery comprising the same SK INNOVATION CO., LTD. (KR) 2017-10-03 US disclosed
US-20140295238-A1 CURRENT COLLECTOR FOR BATTERY AND SECONDARY BATTERY COMPRISING THE SAME SK INNOVATION CO., LTD. (KR) 2014-10-02 US disclosed
US-8394208-B2 Carboxylate-containing polymers for metal surface treatment BASF AKTIENGESELLSCHAFT (DE) 2013-03-12 US disclosed
EP-1978051-B1 Metal plating compositions and methods ROHM & HAAS ELECT MAT (US) 2012-02-22 EP disclosed
US-20120034371-A1 METAL PLATING COMPOSITIONS ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-02-09 US disclosed
US-8048284-B2 Mixture of metal compound and polyamideether copolymer; electrical or decorative article; printed circuits; improved leveling and throwing power ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-11-01 US disclosed
US-20110253545-A1 METHOD OF DIRECT ELECTRODEPOSITION ON SEMICONDUCTORS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-10-20 US disclosed
US-8012334-B2 provide good leveling performance and throwing power; additives to improve the brightness, ductility and plating distribution of the metal deposit ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-09-06 US disclosed
EP-1475463-B1 Reverse pulse plating method SHIPLEY CO LLC (US) 2011-03-30 EP disclosed
US-7879158-B2 passivating aluminum or zinc or alloy of aluminum and zinc surface with water soluble polyvinylimidazole/N-/; corrosion resistance BASF SE (DE) 2011-02-01 US disclosed
US-20050209117-A1 Complexing agent for treating metallic and plastic surfaces BASF AKTIENGESELLSCHAFT (DE) 2005-09-22 US disclosed
US-20050163933-A1 Polymers containing carboxylate for the treatment of metallic surfaces BASF AKTIENGESELLSCHAFT (DE) 2005-07-28 US disclosed
US-20050126427-A1 Polymer derivatives for treating metals BASF AKTIENGESELLSCHAFT (DE) 2005-06-16 US disclosed
US-20050121114-A1 Polymer derivatives for the treatment of metals BASF AKTIENGESELLSCHAFT (DE) 2005-06-09 US disclosed
EP-0807697-B1 A process for producing semi-bright and bright electrogalvanic coatings at high current density from a bath comprising a zinc sulfur-acid salt and composition therefor ATOTECH DEUTSCHLAND GMBH (DE) 2003-08-27 EP disclosed
EP-0730047-B1 High current density zinc chloride electrogalvanizing process and compositions ATOTECH USA INC (US) 2001-11-28 EP disclosed
US-5788822-A High current density semi-bright and bright zinc sulfur-acid salt electrogalvanizing process and composition ELF ATOCHEM NORTH AMERICA, INC. (US) 1998-08-04 US disclosed
EP-0807697-A1 A process for producing semi-bright and bright electrogalvanic coatings at high current density from a bath comprising a zinc sulfur-acid salt and composition therefor ATOTECH Deutschland GmbH (DE) 1997-11-19 EP disclosed
US-5656148-A ELECTROLYSIS OF ZINC HALIDE SOLUTION CONTINING LOW MOLECULAR WEIGHT POLYOXYALKYLENE GLYCOL HOMO OR COPOLYMER AS GRAIN REFINING AGENT AND CONDENSATE OF FORMALDEHYDE AND SULFONATED NAPHTHALENE AS ANTIDENDRITIC AGENT ATOTECH USA, INC. (US) 1997-08-12 US disclosed
EP-0730047-A1 High current density zinc chloride electrogalvanizing process and compositions ATOTECH USA, INC. (US) 1996-09-04 EP disclosed