SCHEMBL5651655

SCHEMBL5651655

O=S(=O)(Oc1ccc([S+](c2ccccc2)c2ccccc2)cc1)C(F)(F)C(F)(F)C1CC2CCC1C2.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
PIK3CD O00329 1/20 0.32
PIK3CA P42336 1/20 0.32
PIK3CB P42338 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL383093 0.84 L3MBTL1 (0.35)
SCHEMBL1772329 0.82 PIK3CD (0.39) PIK3CDPIK3CAPIK3CB
Diphenylsulfane SCHEMBL5651652 0.81 PIK3CD (0.37) PIK3CDPIK3CAPIK3CB
SCHEMBL5651472 0.81 ESR2 (0.32)
SCHEMBL448748 0.79 ALDH1A1 (0.33)
SCHEMBL678432 0.78 HSD11B1 (0.37)
SCHEMBL5645680 0.77 MEN1 (0.34)
SCHEMBL447065 0.77 LMNA (0.37)
SCHEMBL548130 0.77 PIK3CD (0.42) PIK3CDPIK3CAPIK3CB
SCHEMBL5649768 0.76 MMP8 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7217492-B2 Onium salt compound and radiation-sensitive resin composition JSR CORPORATION (JP) 2007-05-15 US disclosed
US-20050053861-A1 Onium salt compound and radiation-sensitive resin composition JSR CORPORATION (JP) 2005-03-10 US disclosed