Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TGM2 | P21980 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL217041 | 0.83 | TSHR (0.32) | ALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL6292970 | 0.82 | TGM2 (0.33) | TGM2 | |
| SCHEMBL17322714 | 0.80 | ALDH1A1 (0.33) | ALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL5917749 | 0.79 | EPHX2 (0.32) | ALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL5917748 | 0.79 | EPHX2 (0.32) | ALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL7711858 | 0.77 | ALDH1A1 (0.34) | ALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL27608641 | 0.77 | LMNA (0.33) | ALDH1A1 | |
| SCHEMBL134073 | 0.75 | ALDH1A1 (0.31) | ALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL5917724 | 0.75 | ALDH1A1 (0.38) | ALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL683013 | 0.74 | ALDH1A1 (0.31) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7147987-B2 | Positive resist composition and pattern formation method using the same | FUJI PHOTO FILM CO. LTD. (JP) | 2006-12-12 | — | — | US | disclosed |
| US-20050069808-A1 | Positive resist composition and pattern formation method using the same | FUJI PHOTO FILM CO., LTD. | 2005-03-31 | — | — | US | disclosed |
| US-6872514-B2 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-29 | — | — | US | disclosed |
| EP-1505442-A1 | Positive resist composition and pattern formation method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2005-02-09 | — | — | EP | disclosed |
| US-20030215739-A1 | Polymers, resist compositions and patterning process | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2003-11-20 | — | — | US | disclosed |
| US-20020155376-A1 | Mixture of radiation sensive compound and binder; fluoropolymers | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2002-10-24 | — | — | US | disclosed |