Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 known ✓ | Q99720 | 4/20 | 0.50 |
| ▸ | OPRK1 known ✓ | P41145 | 3/20 | 0.44 |
| ▸ | OPRM1 known ✓ | P35372 | 3/20 | 0.44 |
| ▸ | OPRD1 known ✓ | P41143 | 2/20 | 0.44 |
| ▸ | MEN1 known ✓ | O00255 | 1/20 | 0.42 |
| ▸ | CHRM2 known ✓ | P08172 | 1/20 | 0.41 |
| ▸ | HTR1A known ✓ | P08908 | 1/20 | 0.41 |
| ▸ | ADRA2A known ✓ | P08913 | 1/20 | 0.41 |
| ▸ | CHRM1 known ✓ | P11229 | 1/20 | 0.41 |
| ▸ | SLC6A2 known ✓ | P23975 | 1/20 | 0.41 |
| ▸ | SLC6A4 known ✓ | P31645 | 1/20 | 0.41 |
| ▸ | ADRA1A known ✓ | P35348 | 1/20 | 0.41 |
| ▸ | DRD3 known ✓ | P35462 | 1/20 | 0.41 |
| ▸ | SLC6A3 known ✓ | Q01959 | 1/20 | 0.41 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.52 |
| ▸ | AOC3 | Q16853 | 3/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.42 |
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9129107 | 0.98 | TAAR1 (0.54) | TAAR1SIGMAR1AOC3KDM4EOPRK1 | |
| Water SCHEMBL5919047 | 0.83 | TAAR1 (0.56) | TAAR1SIGMAR1AOC3KDM4EOPRM1 | |
| SCHEMBL2062577 | 0.83 | FFAR1 (0.50) | KCNH2 | |
| Hydrogen Peroxide SCHEMBL8069823 | 0.81 | SIGMAR1 (0.39) | TAAR1SIGMAR1AOC3KDM4EOPRK1 | |
| SCHEMBL11740957 | 0.81 | TAAR1 (0.58) | TAAR1SIGMAR1AOC3KDM4EOPRM1 | |
| SCHEMBL27885210 | 0.80 | SIGMAR1 (0.65) | TAAR1SIGMAR1AOC3KDM4E | |
| SCHEMBL27904501 | 0.78 | TAAR1 (0.50) | TAAR1SIGMAR1AOC3KDM4EOPRK1 | |
| SCHEMBL79748 | 0.77 | TSHR (0.50) | AOC3OPRK1MEN1NPC1RAB9A | |
| Hydrochloric Acid SCHEMBL11200662 | 0.75 | TSHR (0.48) | AOC3OPRK1MEN1NPC1RAB9A | |
| SCHEMBL2662419 | 0.73 | KMT2A (0.50) | AOC3OPRK1MEN1NPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7022456-B2 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2006-04-04 | — | — | US | disclosed |
| US-6743562-B2 | ACID GENERATORS; FOR THE PRODUCTION OF SEMICONDUCTOR INTEGRATED CIRCUITS, PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-01 | — | — | US | disclosed |
| US-6727033-B2 | A POSITIVE RESIST COMPOSITION COMPRISING A RESIN (A), WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPING SOLUTION, CONTAINING A STRUCTURAL UNIT INCLUDING A GROUP REPRESENTED BY FORMULA (X) DEFINED IN | FUJI PHOTO FILM CO., LTD. (JP) | 2004-04-27 | — | — | US | disclosed |
| US-20040048190-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. | 2004-03-11 | — | — | US | disclosed |
| US-6692883-B2 | GENERATING ACID; ADJUSTMENT SOLUBILITY IN ALKLAINE DEVELOPER | FUJI PHOTO FILM CO., LTD. (JP) | 2004-02-17 | — | — | US | disclosed |
| US-6630280-B1 | Resin and compound that generates an arylsulfonic acid when exposed to actinic radiation; sensitivity; resolution; smoothness | FUJI PHOTO FILM CO., LTD. (JP) | 2003-10-07 | — | — | US | disclosed |
| US-20030134221-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| US-20020172886-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. | 2002-11-21 | — | — | US | disclosed |
| US-6479213-B2 | POLYSILOXANE SYNTHESIZED BY THE REACTION OF A SILANE COMPOUND HAVING AN AMINO GROUP WITH AN AROMATIC ACID ANHYDRIDE AND A COPOLYMERIZATION ALKALI SOLUBLE SILOXANE COMPONENT | FUJI PHOTO FILM CO., LTD. (JP) | 2002-11-12 | — | — | US | disclosed |
| US-20020106581-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. | 2002-08-08 | — | — | US | disclosed |
| US-20010038967-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2001-11-08 | — | — | US | disclosed |
| US-6296985-B1 | POLYSILOXANES THAT CAN DECOMPOSE TO FORM ACID | FUJI PHOTO FILM CO., LTD. (JP) | 2001-10-02 | — | — | US | disclosed |
| US-6004721-A | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1999-12-21 | — | — | US | disclosed |
| US-5939234-A | INCREASING THE PHOTOSENSITIVITY OF PHOTORESISTS COMPRISING A COMPOUND WITH AN ACID-DECOMPOSABLE TERT-ALKYL ESTER AND TERT-ALKYL CARBONATE GROUP AND A POLYHYDROXYSTRENE PROTECTED BY ACETAL OR SILYL ETHER GROUP FOR ALKALI SOLUBILITY | FUJI PHOTO FILM CO., LTD. (JP) | 1999-08-17 | — | — | US | disclosed |
| US-5030550-A | Containing a basic compound and a nonionic surfactant containing oxyethylene and oxypropylene groups | FUJI PHOTO FILM CO., LTD. (JP) | 1991-07-09 | — | — | US | disclosed |
| EP-0132354-B1 | DEVELOPING COMPOSITION FOR LIGHT-SENSITIVE QUINONE B DIAZIDE | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1990-02-07 | — | — | EP | disclosed |
| EP-0132354-A2 | Developing composition for light-sensitive quinone B diazide | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1985-01-30 | — | — | EP | disclosed |
| US-4464461-A | QUATERNARY ALKANOL AMMONIUM HYDROXIDE DEVELOPER AND A SEMICARBIZIDE STABILIZER | EASTMAN KODAK COMPANY (US) | 1984-08-07 | — | — | US | disclosed |
| US-4294911-A | AND A QUATERNARY ALKANOL AMMONIUM HYDROXIDE DEVELOPING AGENT | EASTMAN KODAK COMPANY (US) | 1981-10-13 | — | — | US | disclosed |
| EP-0023758-A1 | Stabilised developer concentrates and developers containing a quaternary alkanol ammonium hydroxide | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1981-02-11 | — | — | EP | disclosed |