SCHEMBL5676183

SCHEMBL5676183

CC(C)(c1ccc(C(C)(C)c2cc(O)c(O)c(O)c2)cc1)c1cc(O)c(O)c(O)c1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 5/20 0.56
HPGD P15428 3/20 0.56
HSD17B10 Q99714 3/20 0.56
CYP3A4 P08684 3/20 0.56
ESR2 Q92731 3/20 0.56
TSHR P16473 2/20 0.56
AR P10275 1/20 0.56
SLC6A2 P23975 1/20 0.56
SLC6A4 P31645 1/20 0.56
HTR6 P50406 1/20 0.56
ESRRG P62508 1/20 0.56
SLC6A3 Q01959 1/20 0.56
ALOX15 P16050 4/20 0.53
ALOX12 P18054 2/20 0.53
ALDH1A1 P00352 4/20 0.50
TDP1 Q9NUW8 2/20 0.50
RECQL P46063 2/20 0.50
CASP1 P29466 1/20 0.50
HIF1A Q16665 1/20 0.50
CNR1 P21554 4/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8407833 0.92 ALOX15 (0.56) ESR1HPGDHSD17B10CYP3A4ESR2
SCHEMBL4058746 0.84 ESR1 (0.61) ESR1HPGDHSD17B10CYP3A4ESR2
SCHEMBL4176203 0.83 ESR1 (0.61) ESR1HPGDHSD17B10CYP3A4ESR2
SCHEMBL28964042 0.82 ESR1 (0.59) ESR1HPGDHSD17B10CYP3A4ESR2
SCHEMBL7158478 0.82 ESR1 (0.53) ESR1HPGDHSD17B10CYP3A4ESR2
SCHEMBL23861439 0.80 ESR1 (0.50) ESR1HPGDHSD17B10CYP3A4ESR2
SCHEMBL5674836 0.80 ALDH1A1 (0.70) ESR1HPGDHSD17B10CYP3A4ESR2
SCHEMBL686758 0.80 ESR1 (0.60) ESR1HPGDHSD17B10CYP3A4ESR2
SCHEMBL21392691 0.79 ESR1 (0.48) ESR1HPGDHSD17B10CYP3A4ESR2
SCHEMBL24748740 0.79 ESR1 (0.58) ESR1HPGDHSD17B10CYP3A4ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1623274-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-02-08 EP claimed
WO-2004088423-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 WO claimed
US-20040197704-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US claimed
US-6790582-B1 NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT CLARIANT FINANCE BVI LIMITED (VG) 2004-09-14 US claimed
EP-1623274-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-02-08 EP disclosed
WO-2004088423-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 WO disclosed
US-20040197704-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US disclosed
US-6790582-B1 NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT CLARIANT FINANCE BVI LIMITED (VG) 2004-09-14 US disclosed
EP-1146394-A1 PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR IMPROVING DRY ETCHING RESISTANCE OF PHOTOSENSITIVE RESIN COMPOSITION CLARIANT INTERNATIONAL LTD. (CH) 2001-10-17 EP disclosed