SCHEMBL575589

SCHEMBL575589

CS(=O)(=O)Oc1ccc(OS(C)(=O)=O)cc1

nearest known ligand 0.52

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CA2 P00918 11/20 0.52
CA9 Q16790 7/20 0.52
ALDH1A1 P00352 2/20 0.50
MMP2 P08253 2/20 0.50
MMP7 P09237 2/20 0.50
MMP9 P14780 2/20 0.50
MMP14 P50281 2/20 0.50
MMP1 P03956 1/20 0.50
CA12 O43570 2/20 0.48
KDM4E B2RXH2 2/20 0.48
GAA P10253 1/20 0.48
CA1 P00915 6/20 0.48
MMP3 P08254 1/20 0.46
MMP8 P22894 1/20 0.46
ENPP3 O14638 1/20 0.46
ENPP1 P22413 1/20 0.46
HPGD P15428 1/20 0.46
CA5A P35218 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3838977 0.92 CA2 (0.58) CA2CA9ALDH1A1MMP2MMP7
SCHEMBL168170 0.89 CA2 (0.64) CA2CA9ALDH1A1MMP2MMP7
SCHEMBL6941035 0.89 CA1 (0.64) CA2CA9ALDH1A1MMP2MMP7
SCHEMBL6037 0.87 CA2 (0.48) CA2CA9ALDH1A1MMP2MMP7
SCHEMBL3736307 0.87 SOS1 (0.45) CA2CA9ALDH1A1MMP2MMP7
SCHEMBL4172581 0.87 CA2 (0.61) CA2CA9ALDH1A1MMP2MMP7
SCHEMBL4609033 0.87 CA2 (0.61) CA2CA9ALDH1A1MMP2MMP7
SCHEMBL2000447 0.87 ALDH1A1 (0.52) CA2CA9ALDH1A1MMP2MMP7
SCHEMBL936248 0.87 MMP2 (0.43) CA2CA9ALDH1A1MMP2MMP7
Hydrochloric Acid SCHEMBL11580385 0.87 CA2 (0.61) CA2CA9ALDH1A1MMP2MMP7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3131868-A1 Process for the manufacture of terphenyl compounds Solvay Specialty Polymers USA, L.L.C. (US) 2017-02-22 EP claimed
WO-2015158580-A1 Process for the manufacture of terphenyl compounds SOLVAY SPECIALTY POLYMERS USA, LLC (US) 2015-10-22 WO claimed
US-5118582-A PATTERN FORMING MATERIAL AND PROCESS FOR FORMING PATTERN USING THE SAME HITACHI, LTD. (JP) 1992-06-02 US claimed
US-20240297344-A1 NONAQUEOUS ELECTROLYTE FOR SECONDARY BATTERY AND NONAQUEOUS-ELECTROLYTE SECONDARY BATTERY EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2024-09-05 US disclosed
US-11616253-B2 Nonaqueous electrolyte for secondary battery and nonaqueous-electrolyte secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2023-03-28 US disclosed
US-20220278370-A1 NONAQUEOUS ELECTROLYTE FOR SECONDARY BATTERY AND NONAQUEOUS-ELECTROLYTE SECONDARY BATTERY EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2022-09-01 US disclosed
US-11367899-B2 Nonaqueous electrolyte for secondary battery and nonaqueous-electrolyte secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2022-06-21 US disclosed
US-10468720-B2 Nonaqueous electrolyte for secondary battery and nonaqueous-electrolyte secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2019-11-05 US disclosed
EP-2144321-B1 NONAQUEOUS ELECTROLYTE FOR SECONDARY BATTERY AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY EMPLOYING THE SAME MITSUBISHI CHEM CORP (JP) 2019-01-23 EP disclosed
EP-2378602-B1 Nonaqueous electrolyte for secondary battery and nonaqueous-electrolyte secondary battery employing the same MITSUBISHI CHEM CORP (JP) 2018-12-19 EP disclosed
EP-2418723-B1 NONAQUEOUS ELECTROLYTE FOR SECONDARY BATTERY AND NONAQUEOUS-ELECTROLYTE SECONDARY BATTERY EMPLOYING THE SAME MITSUBISHI CHEM CORP (JP) 2018-09-19 EP disclosed
EP-0956312-B1 PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL JSR CORP (JP) 2001-10-10 EP disclosed
US-6300465-B1 Process for producing phenylene-containing polymer and film-forming material JSR CORPORATION (JP) 2001-10-09 US disclosed
EP-1138712-A2 Polyarylene copolymers and proton-conductive membrane JSR Corporation (JP) 2001-10-04 EP disclosed
EP-0956312-A1 PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL JSR Corporation (JP) 1999-11-17 EP disclosed
WO-1998033836-A1 PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL JSR CORPORATION (JP) 1998-08-06 WO disclosed
EP-0388813-B1 Pattern forming material and process for forming pattern using the same HITACHI LTD (JP) 1997-12-10 EP disclosed
US-5470996-A Pattern forming material and process for forming pattern using the same HITACHI, LTD. (JP) 1995-11-28 US disclosed
US-5118582-A PATTERN FORMING MATERIAL AND PROCESS FOR FORMING PATTERN USING THE SAME HITACHI, LTD. (JP) 1992-06-02 US disclosed
EP-0388813-A2 Pattern forming material and process for forming pattern using the same HITACHI, LTD. (JP) 1990-09-26 EP disclosed