SCHEMBL57578

SCHEMBL57578

COc1ccc(C(=O)C(C)(C)N(C)C)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 2/20 0.53
CES1 P23141 2/20 0.53
CA1 P00915 5/20 0.52
CA2 P00918 5/20 0.52
PARP1 P09874 1/20 0.50
PARP10 Q53GL7 1/20 0.50
PARP2 Q9UGN5 1/20 0.50
PARP4 Q9UKK3 1/20 0.50
MAPT P10636 2/20 0.49
ALDH1A1 P00352 2/20 0.49
HPGD P15428 1/20 0.49
MAPK1 P28482 2/20 0.47
HSD17B10 Q99714 2/20 0.47
LMNA P02545 1/20 0.47
ALOX15 P16050 1/20 0.47
APEX1 P27695 1/20 0.47
RECQL P46063 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
CYP1A2 P05177 1/20 0.47
CYP3A4 P08684 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10458476 0.89 CES2 (0.53) CES2CES1CA1CA2PARP1
SCHEMBL14156791 0.81 SMN1; SMN2 (0.53) PARP10ALDH1A1HPGDLMNARAB9A
SCHEMBL9681297 0.81 CES2 (0.48) CES2CES1CA1CA2PARP1
SCHEMBL9681265 0.80 BCHE (0.46) CES2CES1CA1CA2PARP1
SCHEMBL10945414 0.80 HPGD (0.50) MAPTALDH1A1HPGDMAPK1LMNA
SCHEMBL757101 0.80 CES2 (0.61) CES2CES1CA1CA2PARP1
SCHEMBL10947494 0.80 CES2 (0.44) CES2CES1MAPTALDH1A1HPGD
SCHEMBL58267 0.79 CA2 (0.50) CES2CES1CA2MAPTALDH1A1
SCHEMBL7637140 0.79 CES2 (0.59) CES2CES1CA1CA2PARP1
SCHEMBL10458127 0.79 CES2 (0.59) CES2CES1CA1CA2PARP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 100 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080180503-A1 INK SET FOR INKJET RECORDING AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2008-07-31 US claimed
CN-111538209-B Photosensitive resin composition, organic EL element partition wall, and organic EL element 日保丽公司 2024-05-14 CN disclosed
CN-117882497-A Adhesive film for circuit connection, circuit connection structure, and method for producing same 株式会社力森诺科 2024-04-12 CN disclosed
CN-117651722-A Thiol-containing composition, photocurable composition, and thermosetting composition 株式会社力森诺科 2024-03-05 CN disclosed
US-11650499-B2 Photosensitive resin composition, organic EL element barrier rib, and organic EL element SHOWA DENKO K.K. (JP) 2023-05-16 US disclosed
US-11599023-B2 Photosensitive resin composition, organic EL element barrier rib, and organic EL element SHOWA DENKO K.K. (JP) 2023-03-07 US disclosed
WO-2023003011-A1 THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION 昭和電工株式会社 2023-01-26 WO disclosed
WO-2023276889-A1 ADHESIVE FILM FOR CONNECTING CIRCUIT, CIRCUIT CONNECTION STRUCTURE, AND METHOD FOR MANUFACTURING SAME 昭和電工マテリアルズ株式会社 2023-01-05 WO disclosed
US-11512204-B2 Squarylium dye and composition containing same TOYO INK SC HOLDINGS CO., LTD. (JP) 2022-11-29 US disclosed
US-20220275241-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC EL ELEMENT PARTITION WALL SHOWA DENKO K.K. (JP) 2022-09-01 US disclosed
US-5106722-A Photoiniators having cyclopentadieneyl or indenyl groups and fluorinated aryl or heterocyclic ring; photoresists of unsaturated compounds CIBA-GEIGY CORPORATION (US) 1992-04-21 US disclosed
US-5068371-A Photoinitiators for polymerization CIBA-GEIGY CORPORATION (US) 1991-11-26 US disclosed
US-5034307-A Photopolymerization of ethylenically unsaturated substrates CIBA-GEIGY CORPORATION (US) 1991-07-23 US disclosed
US-5026625-A Photoinitiators for polymerization of ethylenically unsaturated compounds CIBA-GEIGY CORPORATION (US) 1991-06-25 US disclosed
US-5008302-A Photoinitiators for radiation-induced polymerization of ethylenically unsaturated compounds CIBA-GEIGY CORPORATION (US) 1991-04-16 US disclosed
US-4992547-A Aminoaryl ketone photoinitiators CIBA-GEIGY CORPORATION (US) 1991-02-12 US disclosed
US-4970136-A PHOTOINITIATORS CIBA-GEIGY CORPORATION (US) 1990-11-13 US disclosed
US-4963470-A PHOTOINITIATORS CIBA-GEIGY CORPORATION (US) 1990-10-16 US disclosed
US-4960746-A A-HYDROXY-OR A-AMINO-ACETOPHENONES AND A TITANOCENE COMPOUND SUBSTITUTED BY FLUORINE CIBA-GEIGY CORPORATION (US) 1990-10-02 US disclosed
US-4857654-A Titanocenes and their use CIBA-GEIGY CORPORATION (US) 1989-08-15 US disclosed