SCHEMBL57823

SCHEMBL57823

Cc1ccccc1C(=O)P(=O)(c1ccccc1)c1ccccc1

nearest known ligand 0.55

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
HPGD P15428 4/20 0.50
SMN1; SMN2 Q16637 2/20 0.46
KDM4E B2RXH2 2/20 0.46
ALDH1A1 P00352 2/20 0.46
HSD17B10 Q99714 2/20 0.46
KMT2A Q03164 2/20 0.45
ERCC5 P28715 1/20 0.44
FEN1 P39748 1/20 0.44
FFAR1 O14842 1/20 0.44
CYP3A4 P08684 1/20 0.43
CYP2C9 P11712 1/20 0.43
HTT P42858 2/20 0.42
MAPK1 P28482 2/20 0.42
TSHR P16473 1/20 0.42
NPC1 O15118 1/20 0.42
RAB9A P51151 1/20 0.42
GAA P10253 1/20 0.42
LMNA P02545 1/20 0.42
POLB P06746 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL487265 0.87 LMNA (0.45) HPGDSMN1; SMN2KDM4EALDH1A1HSD17B10
SCHEMBL17023658 0.86 CA2 (0.48) HPGDSMN1; SMN2KDM4EALDH1A1HSD17B10
SCHEMBL8034595 0.85 HPGD (0.50) HPGDSMN1; SMN2KDM4EALDH1A1HSD17B10
SCHEMBL3381277 0.83 HPGD (0.49) HPGDSMN1; SMN2KDM4EALDH1A1HSD17B10
SCHEMBL8400512 0.82 NFE2L2 (0.49) SMN1; SMN2HSD17B10KMT2AHTTTSHR
SCHEMBL31316941 0.82 HPGD (0.39) HPGDKDM4EALDH1A1HSD17B10KMT2A
SCHEMBL1186385 0.81 KMT2A (0.41) HPGDALDH1A1KMT2AHTTTSHR
SCHEMBL29634650 0.81 KMT2A (0.41) HPGDALDH1A1KMT2AHTTTSHR
SCHEMBL260684 0.81 HPGD (0.42) HPGDKDM4EALDH1A1HSD17B10KMT2A
SCHEMBL29984769 0.80 KMT2A (0.38) HPGDSMN1; SMN2ALDH1A1KMT2ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 574 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109321256-B Liquid crystal oligomer and method for preparing sub-5 nm mesoporous film by using same 浙江工业大学 2020-09-11 CN claimed
CN-109321256-A A kind of liquid crystal oligomer and its method for preparing Asia 5nm homopore membrane 浙江工业大学 2019-02-12 CN claimed
US-8642676-B2 Polymerizable composition and acrylic resin film MITSUBISHI RAYON CO., LTD. (JP) 2014-02-04 US claimed
CN-101055419-B Ultraviolet curing free radical type etching glue for micro-nano structure imprinting replication INST OPTICS & ELECT CN ACAD 2010-12-01 CN claimed
CN-101055419-A Ultraviolet curing free radical type etching glue for micro-nano structure imprinting replication INST OPTICS & ELECT CN ACAD (CN) 2007-10-17 CN claimed
EP-3419051-B1 CURABLE RESIN COMPOSITION AND FAN OUT TYPE WAFER LEVEL PACKAGE TAIYO HOLDINGS CO LTD (JP) 2026-04-08 EP disclosed
EP-4286163-B1 ELECTRON BEAM CURABLE INK, AND IMAGE RECORDING METHOD FUJIFILM CORP (JP) 2026-04-01 EP disclosed
EP-4681930-A1 IMAGE RECORDING METHOD, METHOD FOR MANUFACTURING LAMINATE, AND IMAGE RECORDING APPARATUS FUJIFILM Corporation (JP) 2026-01-21 EP disclosed
EP-4238769-B1 INK COMPOSITION DNP FINE CHEMICALS CO LTD (JP) 2025-12-17 EP disclosed
US-20250375971-A1 IMAGE RECORDING METHOD, MANUFACTURING METHOD OF LAMINATE, AND IMAGE RECORDING APPARATUS FUJIFILM CORP (JP) 2025-12-11 US disclosed
EP-4660262-A1 ACTIVE ENERGY RAY-CURABLE INKJET INK, ACTIVE ENERGY RAY-CURABLE INK SET, AND IMAGE RECORDING METHOD FUJIFILM Corporation (JP) 2025-12-10 EP disclosed
US-20250340747-A1 ACTIVE ENERGY RAY CURABLE TYPE INK JET INK, ACTIVE ENERGY RAY CURABLE TYPE INK SET, AND IMAGE RECORDING METHOD FUJIFILM CORP (JP) 2025-11-06 US disclosed
US-5639512-A REFRACTIVE INDEX GRADIENTS SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) 1997-06-17 US disclosed
US-5614253-A DEPOSITING POLYMER LAYER WITH REFRACTIVE INDEX MODIFIER SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) 1997-03-25 US disclosed
EP-0664463-A1 PLASTIC OPTICAL FIBER BASE MATERIAL, PRODUCTION METHOD THEREFOR, AND APPARATUS THEREFOR SUMITOMO ELECTRIC INDUSTRIES, LIMITED (JP) 1995-07-26 EP disclosed
EP-0662620-A1 PRODUCTION METHOD AND APPARATUS FOR PLASTIC OPTICAL FIBER BASE MATERIAL SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) 1995-07-12 EP disclosed
EP-0473643-B1 PHOTOCURABLE PIGMENTED SECONDARY OPTICAL FIBER COATINGS DSM NV (NL) 1994-12-14 EP disclosed
US-4707432-A PROTECTIVE COATINGS, IMAGES CIBA-GEIGY CORPORATION (US) 1987-11-17 US disclosed
US-4324744-A PHOTOINITIATORS BASF AKTIENGESELLSCHAFT (DE) 1982-04-13 US disclosed
US-4265723-A UNSATURATED POLYESTERS OR VINYL ESTERS OF POLYEPOXIDES AND A UV SENSITIZER OF AN ACYL PHOSPHINE OXIDE BASF AKTIENGESELLSCHAFT (DE) 1981-05-05 US disclosed